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1  are prepared by water-leaching and buffered hydrofluoric acid (BHF) etching methods.
2 t (control), air abrasion (AB), etching with hydrofluoric acid (F), the mixture of hydrofluoric acid
3 l-studied, deleterious process that leads to hydrofluoric acid (HF) driven transition metal dissoluti
4            Surface preparation has relied on hydrofluoric acid (HF) electrochemical etching which is
5 s at room temperature with in situ-generated hydrofluoric acid (HF) leads to strong photoluminescence
6 f corrosive and hazardous chemicals, such as hydrofluoric acid (HF) or ammonium bifluoride (NH(4)HF(2
7                                 Here we used hydrofluoric acid (HF) pretreatment to remove phosphorus
8 anchored proteins in the wild-type strain by hydrofluoric acid (HF) pyridine treatment exposed both t
9 e text] LED) were fabricated using a diluted hydrofluoric acid (HF) surface etch treatment.
10           TFBGs were chemically etched using hydrofluoric acid (HF) to partially remove the fiber cla
11 t of pretreating samples by exposing them to hydrofluoric acid (HF) vapor prior to SERS analysis, a s
12  facet of anatase through in situ release of hydrofluoric acid (HF), allowing for the formation of un
13 beings and the environment due to the use of hydrofluoric acid (HF).
14 e fluorine (F) into Cu(2)O nanospheres using hydrofluoric acid (HF).
15 ilicon processing and chemical etching using hydrofluoric acid (HF).
16 rom clinical isolates that were treated with hydrofluoric acid (which removes the A. fumigatus RodA p
17 le for serious injury and death in children: hydrofluoric acid and methacrylic acid.
18 g with hydrofluoric acid (F), the mixture of hydrofluoric acid and nitric acid (FN), or the mixture o
19     Analysis of LTA fragments obtained after hydrofluoric acid and nitrous treatments showed that the
20 d from the lipid A by treatment with aqueous hydrofluoric acid and was identified as galactosamine fo
21 F and complete dephosphorylation of PHF with hydrofluoric acid does not affect PHF solubility.
22             In combination with the directed hydrofluoric acid etching of a glass substrate using a p
23 res no micromanipulation under a microscope, hydrofluoric acid etching, or use of column fittings.
24    After treating PFPA-SNPs or Man-SNPs with hydrofluoric acid followed by lyophilization, the remain
25                The reactions are promoted by hydrofluoric acid generated in situ from potassium hydro
26 hat 1) the activity is sensitive to base and hydrofluoric acid hydrolysis; 2) AF binds to Mono Q, ind
27 ers followed by removal of silica cores with hydrofluoric acid or concentrated alkali.
28 wetland soils were acquired before and after hydrofluoric acid pretreatment to assess quantitatively
29 tively benign reagents, unlike the hazardous hydrofluoric acid required for recovery from silica.
30 hing continues until the silica touching the hydrofluoric acid reservoir is completely removed, essen
31                                              Hydrofluoric acid resistance, (31)P-NMR, and (32)P label
32  Hydrogen termination of oxidized silicon in hydrofluoric acid results from an etching process that i
33                                      We used hydrofluoric acid solution calorimetry to obtain the ent
34 itride surface was treated with concentrated hydrofluoric acid to improve surface homogeneity.
35 quired removal of the GPI anchors by aqueous hydrofluoric acid treatment and cleavage at aspartate-pr
36  of 1,3,4-trimethylimidazolium hydroxide and hydrofluoric acid under hydrothermal conditions at 448 K
37                                              Hydrofluoric acid was utilized to etch out the silica pa
38 led experimental regeneration protocol using hydrofluoric acid without organic solvents.
39    Subsequent dissolution of the silica with hydrofluoric acid yields a free-standing replica of the
40  with the assistance of cationic surfactant, hydrofluoric acid, and ammonia hydroxide.
41 quires users to have experience working with hydrofluoric acid, and it is recommended that users have
42 ed-silica capillary is immersed into aqueous hydrofluoric acid, and water is pumped through the capil
43 ide (Ti3AlC2, a 'MAX' phase) in concentrated hydrofluoric acid, have been shown to have volumetric ca
44 rcumvented by masking with ascorbic acid and hydrofluoric acid, respectively.
45 by annealing followed by partial attack with hydrofluoric acid, result in suites of consistent and co
46 the reaction of CO with the liquid superacid hydrofluoric acid-antimony pentafluoride (HF-SbF5) under
47 hod in addition to the harsher commonly used hydrofluoric acid-based procedure.
48 were prepared and divided into 5 groups: HF (hydrofluoric acid-etching), Er:YAG laser + HF, Graphite
49             We also found that DeltarodA and hydrofluoric acid-treated conidia stimulate significantl
50 i control (- 0.5 V) after removing SiO(x) in hydrofluoric acid.
51 avoidance of handling hazardous concentrated hydrofluoric acid.
52 aggressive chemicals including, for example, hydrofluoric acid.
53 ity for most common ions and is resistant to hydrofluoric acid.
54 al concerns around the usage and disposal of hydrofluoric acid.
55 l aims to standardize the more commonly used hydrofluoric acid/HCl etching method, which produces Ti(
56 C(2) MAX, wet chemical etching of the MAX in hydrofluoric acid/HCl solution to yield multilayer Ti(3)
57 n-bearing materials, we suggest physical and hydrofluoric-acid barrier coatings such as WO3, LiAl5O8
58 gs for a cathode, we further present optimal hydrofluoric-acid scavengers such as Li2SrSiO4, Li2CaSiO
59 coatings such as WO3, LiAl5O8 and ZrP2O7 and hydrofluoric-acid scavengers such as Sc2O3, Li2CaGeO4, L