ライフサイエンスコーパス: lithographic

1 ral technological obstacles, as conventional lithographic and etching techniques may affect the surfa

2 gle-crystal silver nanostructures defined by lithographic and etching techniques.

3 We have used lithographic and self-assembly techniques to fabricate a

4 plications, we detail the fabrication of the lithographic apparatus and the deposition of two materia

5 nisms of selected laser sintering and stereo lithographic apparatus and the properties of custom shel

6 n of the BCP nanostructures is essential for lithographic applications, but dissimilar surface/interf

7 PPA and makes it an attractive candidate for lithographic applications.

8 cular architectures complements the top-down lithographic approach for construction of functional dev

9 niques, this approach affords a direct-write lithographic approach to constructively modifying and pa

10 e readily generated with any typical optical lithographic approach.

11 using this method, at scales out of reach of lithographic approaches (such as electron-beam lithograp

12 Lithographic approaches are capable of creating freestan

13 nopore topologies in graphene using top-down lithographic approaches has proven to be challenging due

14 Recently, so-called 'soft' lithographic approaches have been combined with surfacta

15 Recently, several easy and cost-effective lithographic approaches have been reported to produce ~1

16 Because the components are all made by lithographic approaches with high geometrical fidelity,

17 ication of such structures relies heavily on lithographic approaches, although self-assembly routes t

18 is scale is beyond the capability of current lithographic approaches.

19 A origami molecule whose energy landscape on lithographic binding sites has a unique maximum.

20 Such 3D lithographic capabilities present a tantalizing prospect

21 studied using a number of QPCs with varying lithographic channel width but fixed channel length.

22 Several lithographic, chemical and synthetic procedures are know

23 Currently, making GNRs using lithographic, chemical or sonochemical methods is challe

24 ur experiments demonstrate a new paradigm in lithographic control of a self-assembly process on H-Si

25 emical vapour deposition of MoS2 followed by lithographic definition of a field-effect transistor str

26 re the relaxed state, allowing for nanoscale lithographic definition of aged sections.

27 Precise, lithographic definition of the guiding channels allowed

28 to each two-terminal Mott memory device per lithographic design, and both neuron- and synapse-like d

29 lems, including shape-from-shading problems, lithographic development calculations in microchip manuf

30 Preliminary lithographic evaluations show that cis-1-methyl-2-(4-(tr

31 We describe the lithographic fabrication and characterization of pattern

32 oxide on a silicon wafer; it was followed by lithographic fabrication of a photonic crystal nanocavit

33 Photopatterning and lithographic fabrication of isolated porous silicon stru

34 3 d and is suitable for those familiar with lithographic fabrication procedures.

35 To demonstrate their potential, we develop lithographic fabrication-and-release protocols to protot

36 of chemically amplified photoresists at the lithographic feature edge at length scales between 1 nm

37 initiators result in the inverse scaling of lithographic feature size with exposure time.

38 st/developer interactions on the fidelity of lithographic features.

39 ic patterns 18-26% sharper with atomic-scale lithographic fidelity.

40 ial systems, lead to possible biomedical and lithographic functions.

41 Herein, a lithographic generation of OCCs on solid-state semicondu

42 uited for optical device integration using a lithographic layer-by-layer approach.

43 on Montsechia vidalii, first recovered from lithographic limestone deposits in the Pyrenees of Spain

44 oming almost impossible, due to physical and lithographic limitations.

45 ing of the chemical latent image at an ideal lithographic line-edge that separates optical resolution

46 hout the need for expensive tooling, dies or lithographic masks.

47 trasonic fracture, mechanical grinding or by lithographic means.

48 Here we present a soft lithographic method based on intaglio printing to genera

49 A new soft-lithographic method for micropatterning polymeric resist

50 al amplification with microengraving (a soft lithographic method for printing arrays of secreted prot

51 The development of a lithographic method that can rapidly define nanoscale fe

52 ment step, and promises the possibility of a lithographic method that is solvent-free.

53 No current lithographic method, however, is capable of adjusting ea

54 Lithographic methods and selective chemical modification

55 Top-down lithographic methods can produce multifunctional nanopar

56 ecise sp(2) macromolecules requires top-down lithographic methods on insulating surfaces in order to

57 terning can be achieved by a large number of lithographic methods such as AFM, electron-beam, elastom

58 hallenging and is mostly done using top-down lithographic methods with ~10 nm resolution.

59 have been fabricated on plastic and glass by lithographic methods, the choice of device substrates is

60 substrates are manufactured by conventional lithographic methods, the development of a cost-effectiv

61 In contrast with traditional lithographic methods, the fabrication method relies on s

62 a simple technique, applicable to many soft lithographic methods, to fabricate robust microchannels

63 el pitches than those created using existing lithographic methods.

64 ssibility of realizing complex designs using lithographic methods.

65 pid membranes but also as an alternative for lithographic methods.

66 complex materials that cannot be produced by lithographic methods.

67 'Top-down' (for example, lithographic) methods for nanoscale manipulation reach o

68 A simple lithographic micro/nanofabrication process was used to c

69 We report the lithographic microfabrication of a movable thin film mic

70 idelity, micron-scale features by using soft lithographic/micromolding techniques.

71 with different tensile strengths using soft lithographic molding.

72 r stochastic silicon pillar arrays formed by lithographic or metal dewetting protocols, respectively.

73 inting under ambient conditions with minimal lithographic or thermal overheads.

74 n included in the semiconductor roadmap as a lithographic pathway to enable continued device scaling.

75 Continued scaling-down of lithographic-pattern feature sizes has brought templated

76 phene nanoribbon semiconductors derived from lithographic patterning and narrowing.

77 uire a combination of the high throughput of lithographic patterning and the high resolution and chem

78 ith 2D materials has largely been limited to lithographic patterning and/or undefined deposition of m

79 The strain relaxation due to lithographic patterning induces a magnetic anisotropy th

80 g methods can extend the precision of planar lithographic patterning into the third dimension and cre

81 Moreover, lithographic patterning is often required for fabricatin

82 nerated by this catalytically amplified soft lithographic patterning method.

83 rs some potential advantages over other soft-lithographic patterning methods in that it is amenable t

84 s is usually accomplished with templating or lithographic patterning methods that are only applicable

85 In addition, photoinhibition-enabled lithographic patterning of frontal polymerizations is de

86 Large-scale graphene electronics requires lithographic patterning of narrow graphene nanoribbons f

87 use most micro- and nanofabrication involves lithographic patterning of planar materials.

88 t quantum defects using light and may enable lithographic patterning of quantum emitters with electro

89 Here we report a technique for non-lithographic patterning of silver nanowires on flexible

90 amethylammonium hydroxide enables extreme UV lithographic patterning of sub-10 nm HfO2 structures.

91 conductor without the need for ferromagnets, lithographic patterning techniques, or quantum-confined

92 ridging from the submicrometer dimensions of lithographic patterning to the nanometer-scale dimension

93 de photonic materials, bottlebrush films for lithographic patterning, drug delivery, and tumor detect

94 ly amenable to mask-based and laser-scanning lithographic patterning, enabling full four-dimensional

95 stal alignment surfaces based on printing or lithographic patterning.

96 rpened probes have smaller radii and produce lithographic patterns 18-26% sharper with atomic-scale l

97 RLS) trade-off has fundamentally limited the lithographic performance of chemically amplified resists

98 ers: (i) the shape, size, and orientation of lithographic pinning features on the spanned surfaces; (

99 for other types of plasmonic nanomaterials, lithographic plasmonic nanoparticle arrays, are discusse

100 ypically relies on large area CVD growth and lithographic post-processing for nanodevice fabrication,

101 A lithographic procedure is used to isolate cylindrical mi

102 Subsequent lithographic procedures revealed excellent graphoepitaxi

103 ified or erased without the need for complex lithographic procedures.

104 A four-step soft lithographic process based on micro-contact printing of

105 device substrates is severely limited by the lithographic process temperature and substrate propertie

106 e anisotropically patterned through standard lithographic process with hydrophilic channels separatin

107 NA as a scaffolding material with a one-step lithographic process, we demonstrate the patterning of s

108 ubstrate was produced without performing the lithographic process.

109 microelectrode sensor was fabricated with a lithographic process; active electrode area was defined

110 atured medium or surface, however, is costly lithographic processes for structural patterning which r

111 Lithographic processes have been widely explored in cell

112 ps, eliminating the requirement of expensive lithographic processes to form simple structures.

113 practical, parallel, compatible with current lithographic processes, and amenable to multilayered dev

114 text of photonic devices, sensor techniques, lithographic processes, imaging techniques, data process

115 nd poly(methyl methacrylate) (PMMA)-assisted lithographic processes, leading to unprecedented covalen

116 m chemical incompatibility with conventional lithographic processes.

117 for producing flow-RPSs that do not require lithographic processes.

118 rs and their fabrication requires multi-step lithographic processes.

119 based black materials, and does not require lithographic processes.

120 to its compatibility with industry-standard lithographic processing, electron mobilities up to 150 t

121 alkyl resorcinarene was synthesized, and its lithographic properties were evaluated.

122 role of individual gold atoms in forming 3D lithographic resists.

123 noscale forces are engineered to achieve sub-lithographic resolutions.

124 gurable molecules in MOS technologies as the lithographic scales approach the molecular limit.

125 Moreover, lithographic scaling limits have so far precluded the fa

126 er an attractive solution owing to their sub-lithographic sizes and unique geometry, coupled with the

127 n nano-posts on glass, are fabricated in one lithographic step that could be performed with high-thro

128 ransistor fabrication requires only a single lithographic step.

129 chieved because they are defined in a single lithographic step.

130 fabrication techniques often require complex lithographic steps and the use of toxic chemicals.

131 Mask-based and laser-scanning lithographic strategies using commonly available light s

132 trates that can be fabricated using top-down lithographic strategies.

133 the electric field enhancement for isolated lithographic structures.

134 ics standpoint, including crystal growth and lithographic structuring methods.

135 ly control thermal emission, often requiring lithographic structuring of the surface and causing sign

136 miconductor junctions in MoTe2 in a two-step lithographic synthesis.

137 cost of the state-of-the-art high-resolution lithographic systems are prompting unconventional routes

138 Micro-3D printing is a lithographic technique capable of creating aggregates in

139 We developed a lithographic technique for fabrication of chemically ani

140 The lithographic technique is applicable to a wide variety o

141 Microengraving is a soft lithographic technique that provides a rapid and efficie

142 ur presentation of this strategy includes: a lithographic technique to build functional microfluidic

143 We describe the lithographic technique used to form endothelialized micr

144 Polymer pen lithography, a parallel lithographic technique, is combined with an ink spray-co

145 In this laser-based lithographic technique, microscopic containers are forme

146 ing a unique fluorinated barrier layer-based lithographic technique, we fabricated a lateral organic

147 es on the development of a parallel ion beam lithographic technique, which assures the time-effective

148 Here we describe a different lithographic technique, which we call erasable electrost

149 A simple, scalable, non-lithographic, technique for fabricating durable superhyd

150 Standard lithographic techniques and anisotropic deep-reactive io

151 anocomposite thin films utilizing mask-based lithographic techniques and laser scanning methods.

152 y to a surface generally requires the use of lithographic techniques and specialized equipment.

153 rds integrating MOF deposition with existing lithographic techniques and the incorporation of these m

154 Notably, the lithographic techniques employed were amenable to differ

155 This technology adapts the lithographic techniques from the microelectronics indust

156 Many soft-lithographic techniques have been developed for their fa

157 Qubits that are defined using lithographic techniques have been suggested to enable th

158 ic constraints of conventional synthetic and lithographic techniques have limited the types of multi-

159 f polymer brushes, carbon dots, and advanced lithographic techniques marks a substantial advancement

160 Soft-lithographic techniques show great promise for simple an

161 addition, DLAs are fabricated via low-cost, lithographic techniques that can be used for mass produc

162 From lithographic techniques that enable high-density silicon

163 lid-state qubits manufactured using standard lithographic techniques that have demonstrated two-qubit

164 thin films of block copolymer with advanced lithographic techniques to induce epitaxial self-assembl

165 The concepts are illustrated by use of soft lithographic techniques to transfer 2D patterns to cylin

166 First, traditional lithographic techniques were adapted to fabricate bulk e

167 The fusion of maturing low-cost lithographic techniques with newer optical design strate

168 abricate cheap, large-area devices using non-lithographic techniques--for example, by exploiting dewe

169 technology due to the limitations of current lithographic techniques.

170 res with a precision that challenges current lithographic techniques.

171 cating nanoscale arrays are usually based on lithographic techniques.

172 magnitude smaller than can be fabricated by lithographic techniques.

173 onventional nanostructure formation based on lithographic techniques.

174 ing capabilities that are unmatched by other lithographic techniques.

175 maller than what can be produced by top-down lithographic techniques.

176 we focus on three of the commonly used soft lithographic techniques: (i) microcontact printing of al

177 h is based on fast, low-cost, and high-yield lithographic technologies and demonstrates the feasibili

178 There is growing interest in lithographic technologies for creating 3D microstructure

179 in new materials, transistor structures, and lithographic technologies will enable further scaling.

180 llars that uses polystyrene nanospheres as a lithographic template.

181 Using soft lithographic templates, we assemble three-dimensional, g

182 index, and facile pattern formation through lithographic templating and/or etching.

183 layer-by-layer alignment or high-resolution lithographic templating.

184 onstructing larger materials with the use of lithographic tools (i.e., physical top-down) or through

185 Lithographic top-down processing allows a high level of

186 tracking microscopy, we show that microscale lithographic triangular platelets form two different tri

187 QCL output are selectively suppressed using lithographic tuning and single mode operation of the mul

188 between the Au-filled template array and the lithographic UME platform array was achieved by potentio

189 n in the size of the hysteresis loops as the lithographic width of the QPC channel increases.