ライフサイエンスコーパス: silicon dioxide

1 ted with saccharin, sucrose, acesulfame, and silicon dioxide.

2 a conductive nanocrystal silicon filament in silicon dioxide.

3 ct contact with silicon, with no interfacial silicon dioxide.

4 e and combustion of the precipitate to yield silicon dioxide.

5 mension was obtained for an unpaired spin in silicon dioxide.

6 ed cupric oxide reactor, rather than forming silicon dioxide.

7 ease caused by the inhalation of crystalline silicon dioxide.

8 al analysis (GKMA) method to study amorphous silicon dioxide (a-SiO2).

9 nly used in biochemical reactions can remove silicon dioxide, a material frequently used as the solid

10 eposits highly conformal layers of amorphous silicon dioxide and aluminum oxide nanolaminates at rate

11 VPCs) made from dielectric materials such as silicon dioxide and common polymers used in three-dimens

12 re important inorganic examples too, such as silicon dioxide and elemental selenium (the latter being

13 uctor field-effect transistors, formed using silicon dioxide and silicon, have undergone four decades

14 The wavelike silicon dioxide arch microstructure exhibits Young modul

15 is technology close at hand, alternatives to silicon dioxide are being pursued to enable new function

16 neration branched polyamidoamine dendrons on silicon dioxide as a way to tailor and control the subse

17 hydrophobic silicon dioxide particles (fumed silicon dioxide), as model air pollutants, and Langmuir

18 th temperature allows for the removal of the silicon dioxide barrier layer associated with catalytic

19 (n-nHA), granule-shaped hydroxyapatite, and silicon dioxide can effectively impair tumor progression

20 We examined PCR in silicon dioxide-coated silicon-glass chips (12 microl in

21 rs (TFTs) with high field effect mobility on silicon dioxide dielectrics that are treated with alkylt

22 ilized on the surface of streptavidin-coated silicon dioxide exhibited specific capture of pathogenic

23 covalently immobilizing arrayed probes on a silicon dioxide film.

24 The analytical procedure was set up on a silicon dioxide flat substrate to standardize SERS metho

25 eep by concentrating the collected prions on silicon dioxide, followed by amplification by serial pro

26 rgent problem of identifying alternatives to silicon dioxide for the gate dielectric in logic devices

27 ion in 54 strongly peraluminous high-silica (silicon dioxide >70 weight %) leucogranites from the Him

28 ved by introducing an ultra-thin sacrificial silicon dioxide hardmask layer on the substrate which is

29 al devices based on nanocrystals embedded in silicon dioxide has been the development of a method for

30 ansdermal biosensor makes use of an array of silicon-dioxide hollow microneedles that are about one o

31 notubes (CNTs) accelerate the wet etching of silicon dioxide in a strong alkaline solution.

32 epth over time, and we find the etch rate of silicon dioxide in different buffers that ranges from 2.

33 ere kept constant by adding an inert filler, silicon dioxide in inverse concentrations to the fiber f

34 taining copper oxide, calcium carbonate, and silicon dioxide in volume ratios of 60, 30, and 10%, res

35 s similar to that of the quartz polymorph of silicon dioxide, indicating that it is an extended coval

36 endent conductance properties of the classic silicon dioxide insulator.

37 The silicon dioxide is converted to cesium hexafluosilicate

38 Silicon dioxide is one of the most abundant natural comp

39 Such a nanomaterial, when consisting of pure silicon dioxide, is generally considered to be chemicall

40 ials need to be developed to replace current silicon dioxide (k = 3.9) or SiCOH, etc.

41 m gold micro-electrodes fabricated on native silicon dioxide layer grown on semiconducting single cry

42 oconductors that are supported directly on a silicon dioxide layer, and we measure the minimum featur

43 rved PR topography can be transferred to the silicon dioxide layer.

44 s) but forms TFTs with poor mobility on bare silicon dioxide (<0.005 cm2/V s).

45 ned elusive despite the indispensable use of silicon dioxide materials in advanced electronic devices

46 molded materials in porous silicon or porous silicon dioxide multilayer (rugate dielectric mirror) st

47 uation of a new prototype dispersant system, silicon dioxide nanoparticles (NPs) functionalized with

48 Amorphous silicon dioxide nanoparticles (SiNPs) are ubiquitous, an

49 Amorphous silicon dioxide nanoparticles (SiO(2) NPs) are widely pr

50 copolymer and hydrophobic surface functional silicon dioxide nanoparticles that are infused into one

51 e wavelength of visible light, a transparent silicon dioxide nanopillar embedded in a nontransparent

52 we demonstrate the use of vertically aligned silicon dioxide nanopillars to achieve below-the-diffrac

53 s inflammasome agonists, including nanoscale silicon dioxide (NanoSiO2), calcium pyrophosphate dihydr

54 sor based on a p-n junction, is created on a silicon dioxide/nitride surface by anisotropic etching.

55 ollow up of our previous study where grafted silicon dioxide NPs functionalized with GPS and grafted

56 The interaction of hydrophobic silicon dioxide particles (fumed silicon dioxide), as mo

57 trate this new approach together with larger silicon dioxide particles (SiO2, 0.5 mum) representing N

58 yer of bovine serum albumin (BSA), while the silicon dioxide regions where the OTMS has been removed

59 m electrode separation were fabricated using silicon dioxide sacrificial layer techniques.

60 aphs, we examined the girdle elements of the silicon dioxide shell from several hundred diatom specie

61 s secondary to the aspiration of crystalline silicon dioxide (silica) into the lungs, activation of t

62 s secondary to the aspiration of crystalline silicon dioxide (silica) into the lungs, activation of t

63 for enzyme variants capable of synthesizing silicon dioxide (silica) or titanium dioxide (titania) c

64 m, molybdenum, tungsten, silicon, germanium, silicon dioxide, silicon nitride, silk and synthetic pol

65 vapour deposited graphene films on sapphire, silicon dioxide/silicon and germanium.

66 We achieve silicon dioxide/silicon gratings with 75-nanometer half-

67 The substances include silicon dioxide (SiO(2)) and iron oxide (Fe(3)O(4)) nano

68 r adlayers adsorbed on the graphene (GE) and silicon dioxide (SiO(2)) have been constituted a scaffol

69 Silicon dioxide (SiO(2)) having low and tunable refracti

70 nize sIgE to molecular allergens by means of silicon dioxide (SiO(2)) NPs.

71 ical vapor deposition (CVD) method on either silicon dioxide (SiO(2)) on silicon (Si) or Si substrate

72 rophilic Lewis acid boric acid (B(OH)(3)) or silicon dioxide (SiO(2)), in the presence of oxalic acid

73 anium dioxide (TiO(2)), polystyrene (PS) and silicon dioxide (SiO(2)), on a microbial eukaryote (the

74 th food and pharmaceutical sectors) based on silicon dioxide (SiO(2), loading capacity: 1(extract):7(

75 This study evaluated the impact of silicon dioxide (SiO(2)-NPs) and selenium nanoparticles

76 n important atmospheric constituent, whereas silicon dioxide (SiO2) is a covalent solid, and one of t

77 rray of hybrid molybdenum disulfide (MoS2) - silicon dioxide (SiO2) one-dimensional, free-standing ph

78 ed by a variety of surface treatments to the silicon dioxide (SiO2) substrates prior to CVD graphene

79 Films of silicon dioxide (SiO2) were deposited at room temperatur

80 Three different types of surface, silicon dioxide (SiO2), silicon nitride (Si3N4), and tit

81 abricated single-layer graphenes (SLGs) on a silicon dioxide (SiO2)/Si substrate, a silicon nitride (

82 This study investigated the effects of silicon dioxide (SiO2, silica) particle size on the mech

83 separated from a gold ground plane by a thin silicon dioxide spacer.

84 ely packed mushroom-like nanostructures with silicon dioxide stems (~40 nm) and gold caps (~22 nm), w

85 ging micropatterned platinum structures at a silicon dioxide substrate in intermittent (dynamic) and

86 of single-crystalline silicon supported on a silicon dioxide substrate.

87 Silicon and silicon dioxide substrates placed in the path of the ato

88 eld-effect transistors fabricated on silicon/silicon dioxide substrates showed electron mobilities as

89 with different phosphoinositides on silicon/silicon dioxide substrates to quantify the binding of va

90 e prepared on hydrophobically functionalized silicon dioxide substrates via vesicle spreading.

91 Using silicon dioxide substrates, water films ranging from ang

92 vertically-aligned carbon nanotubes grown on silicon dioxide substrates.

93 ters in silicon nitride (SiN) films grown on silicon dioxide substrates.

94 interaction of these nanoparticles with the silicon dioxide support does not lead to Pt-Sn segregati

95 kappa of monolayer graphene exfoliated on a silicon dioxide support is still as high as about 600 wa

96 et NbOx (x = 2 and 2.5) films deposited on a silicon dioxide surface as references.

97 ed the same volatility and reactivity with a silicon dioxide surface as those of the hexacarbonyl com

98 on the micrometer scale, were prepared on a silicon dioxide surface by direct exfoliation of crystal

99 SLBs are prepared on the silicon dioxide surface of the microcantilevers using a

100 Two of the MEMS devices, silicon dioxide surface-micromachined cantilever arrays

101 r of n-octadecyltrimethoxysilane (OTMS) on a silicon dioxide surface.

102 ctions between different aqueous species and silicon dioxide surfaces.

103 r higher permittivity dielectrics to replace silicon dioxide, the properties of which have hitherto b

104 Beyond the well-known silicon dioxide, there are phases with different stoichi

105 d differential adsorption of the vesicles on silicon dioxide, titania, and gold surfaces, and the dif

106 easurements of graphene samples on amorphous silicon dioxide to show that full recovery to the therma

107 m the chemical mechanical polishing (CMP) of silicon dioxide using ceria slurry and ceria fixed abras

108 rity solar-grade silicon films directly from silicon dioxide via a one-step electrodeposition process

109 (2) and GeO(2) where the surface area of the silicon dioxide was 2 orders of magnitude higher than th

110 ophobic self-assembled monolayers on gold or silicon dioxide were used to harvest conditioning layers

111 release revealed that pSiO2-CO2H:DNR (porous silicon dioxide with covalent loading of daunorubicin) w