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1 tween alkyne-containing polymeric backbones (PHEMA-alkyne) and azido-terminated polymeric SCs were co
2 sed ion-induced damage accumulation rates in PHEMA.
3 growth of poly(hydroxyl-ethyl methacrylate) (PHEMA) brush, contributing to marked SPR signal enhancem
4 rushes of poly(hydroxyl-ethyl methacrylate) (PHEMA) via an ATRP mechanism.
5 e growth of poly(hydroxyethyl methacrylate) (PHEMA) at the end of immobilized DNA molecules and forme
6 ated with poly(2-hydroxyethyl methacrylate) (PHEMA) brushes that are derivatized with Fe(III)-nitrilo
7    Linear poly(2-hydroxyethyl methacrylate) (PHEMA) polymers were synthesized first by ATRP.
8 ) (PMMA), poly(2-hydroxyethyl methacrylate) (PHEMA), and trifluoroacetic anhydride-derivatized poly(2
9 omposite of PMMA (poly-methyl-methacrylate), PHEMA (poly-hydroxyl-ethyl-methacrylate), and calcium hy
10 block of poly(2-hydroxyethyl methacrylates) (PHEMA) that is randomly functionalized by anthracene.
11                                  Fe(III)-NTA-PHEMA brushes (60 nm thick) have a phosphopeptide bindin
12 ptic digests of beta-casein, the Fe(III)-NTA-PHEMA brushes allow detection of as little as 15 fmol of
13 ontaining samples enriched using Fe(III)-NTA-PHEMA-modified plates also demonstrate higher recoveries
14                       A calibration curve of PHEMA amplification for CT detection based on surface co
15                             The formation of PHEMA altered substrate opacity, rendering the correspon
16 at takes advantage of the hydroxyl groups of PHEMA brushes from the first step to form hyperbranched
17      Additionally, the presence of a PMMA or PHEMA overlayer significantly decreased the sputter rate
18 ized poly(2-hydroxyethyl methacrylate) (TFAA-PHEMA) on silicon substrates.
19 ificantly decreased the sputter rate of TFAA-PHEMA underlayers due to ion-induced damage accumulation
20 de groups on essentially every monomer unit (PHEMA-alkyne) were obtained.
21 EO-N3 with Mn = 775 g/mol, were reacted with PHEMA-alkyne (degree of polymerization = 210) at a high
22                      Multilayer samples with PHEMA as the outermost layer resulted in lowered sputter

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