ライフサイエンスコーパス: lithographic

1 gle-crystal silver nanostructures defined by lithographic and etching techniques.

2 We have used lithographic and self-assembly techniques to fabricate a

3 plications, we detail the fabrication of the lithographic apparatus and the deposition of two materia

4 nisms of selected laser sintering and stereo lithographic apparatus and the properties of custom shel

5 PPA and makes it an attractive candidate for lithographic applications.

6 cular architectures complements the top-down lithographic approach for construction of functional dev

7 niques, this approach affords a direct-write lithographic approach to constructively modifying and pa

8 e readily generated with any typical optical lithographic approach.

9 using this method, at scales out of reach of lithographic approaches (such as electron-beam lithograp

10 Lithographic approaches are capable of creating freestan

11 Recently, so-called 'soft' lithographic approaches have been combined with surfacta

12 Because the components are all made by lithographic approaches with high geometrical fidelity,

13 ication of such structures relies heavily on lithographic approaches, although self-assembly routes t

14 Such 3D lithographic capabilities present a tantalizing prospect

15 Several lithographic, chemical and synthetic procedures are know

16 Currently, making GNRs using lithographic, chemical or sonochemical methods is challe

17 ur experiments demonstrate a new paradigm in lithographic control of a self-assembly process on H-Si

18 emical vapour deposition of MoS2 followed by lithographic definition of a field-effect transistor str

19 re the relaxed state, allowing for nanoscale lithographic definition of aged sections.

20 lems, including shape-from-shading problems, lithographic development calculations in microchip manuf

21 Preliminary lithographic evaluations show that cis-1-methyl-2-(4-(tr

22 We describe the lithographic fabrication and characterization of pattern

23 oxide on a silicon wafer; it was followed by lithographic fabrication of a photonic crystal nanocavit

24 Photopatterning and lithographic fabrication of isolated porous silicon stru

25 of chemically amplified photoresists at the lithographic feature edge at length scales between 1 nm

26 initiators result in the inverse scaling of lithographic feature size with exposure time.

27 st/developer interactions on the fidelity of lithographic features.

28 ic patterns 18-26% sharper with atomic-scale lithographic fidelity.

29 ial systems, lead to possible biomedical and lithographic functions.

30 uited for optical device integration using a lithographic layer-by-layer approach.

31 on Montsechia vidalii, first recovered from lithographic limestone deposits in the Pyrenees of Spain

32 oming almost impossible, due to physical and lithographic limitations.

33 ing of the chemical latent image at an ideal lithographic line-edge that separates optical resolution

34 hout the need for expensive tooling, dies or lithographic masks.

35 trasonic fracture, mechanical grinding or by lithographic means.

36 Here we present a soft lithographic method based on intaglio printing to genera

37 A new soft-lithographic method for micropatterning polymeric resist

38 al amplification with microengraving (a soft lithographic method for printing arrays of secreted prot

39 The development of a lithographic method that can rapidly define nanoscale fe

40 ment step, and promises the possibility of a lithographic method that is solvent-free.

41 Lithographic methods and selective chemical modification

42 Top-down lithographic methods can produce multifunctional nanopar

43 ecise sp(2) macromolecules requires top-down lithographic methods on insulating surfaces in order to

44 terning can be achieved by a large number of lithographic methods such as AFM, electron-beam, elastom

45 have been fabricated on plastic and glass by lithographic methods, the choice of device substrates is

46 substrates are manufactured by conventional lithographic methods, the development of a cost-effectiv

47 In contrast with traditional lithographic methods, the fabrication method relies on s

48 a simple technique, applicable to many soft lithographic methods, to fabricate robust microchannels

49 pid membranes but also as an alternative for lithographic methods.

50 complex materials that cannot be produced by lithographic methods.

51 'Top-down' (for example, lithographic) methods for nanoscale manipulation reach o

52 A simple lithographic micro/nanofabrication process was used to c

53 We report the lithographic microfabrication of a movable thin film mic

54 idelity, micron-scale features by using soft lithographic/micromolding techniques.

55 with different tensile strengths using soft lithographic molding.

56 r stochastic silicon pillar arrays formed by lithographic or metal dewetting protocols, respectively.

57 Continued scaling-down of lithographic-pattern feature sizes has brought templated

58 phene nanoribbon semiconductors derived from lithographic patterning and narrowing.

59 uire a combination of the high throughput of lithographic patterning and the high resolution and chem

60 The strain relaxation due to lithographic patterning induces a magnetic anisotropy th

61 g methods can extend the precision of planar lithographic patterning into the third dimension and cre

62 nerated by this catalytically amplified soft lithographic patterning method.

63 rs some potential advantages over other soft-lithographic patterning methods in that it is amenable t

64 Large-scale graphene electronics requires lithographic patterning of narrow graphene nanoribbons f

65 t quantum defects using light and may enable lithographic patterning of quantum emitters with electro

66 Here we report a technique for non-lithographic patterning of silver nanowires on flexible

67 amethylammonium hydroxide enables extreme UV lithographic patterning of sub-10 nm HfO2 structures.

68 conductor without the need for ferromagnets, lithographic patterning techniques, or quantum-confined

69 ridging from the submicrometer dimensions of lithographic patterning to the nanometer-scale dimension

70 de photonic materials, bottlebrush films for lithographic patterning, drug delivery, and tumor detect

71 stal alignment surfaces based on printing or lithographic patterning.

72 rpened probes have smaller radii and produce lithographic patterns 18-26% sharper with atomic-scale l

73 ers: (i) the shape, size, and orientation of lithographic pinning features on the spanned surfaces; (

74 A lithographic procedure is used to isolate cylindrical mi

75 Subsequent lithographic procedures revealed excellent graphoepitaxi

76 ified or erased without the need for complex lithographic procedures.

77 A four-step soft lithographic process based on micro-contact printing of

78 device substrates is severely limited by the lithographic process temperature and substrate propertie

79 e anisotropically patterned through standard lithographic process with hydrophilic channels separatin

80 NA as a scaffolding material with a one-step lithographic process, we demonstrate the patterning of s

81 ubstrate was produced without performing the lithographic process.

82 microelectrode sensor was fabricated with a lithographic process; active electrode area was defined

83 atured medium or surface, however, is costly lithographic processes for structural patterning which r

84 Lithographic processes have been widely explored in cell

85 ps, eliminating the requirement of expensive lithographic processes to form simple structures.

86 practical, parallel, compatible with current lithographic processes, and amenable to multilayered dev

87 text of photonic devices, sensor techniques, lithographic processes, imaging techniques, data process

88 rs and their fabrication requires multi-step lithographic processes.

89 based black materials, and does not require lithographic processes.

90 to its compatibility with industry-standard lithographic processing, electron mobilities up to 150 t

91 alkyl resorcinarene was synthesized, and its lithographic properties were evaluated.

92 role of individual gold atoms in forming 3D lithographic resists.

93 gurable molecules in MOS technologies as the lithographic scales approach the molecular limit.

94 Moreover, lithographic scaling limits have so far precluded the fa

95 er an attractive solution owing to their sub-lithographic sizes and unique geometry, coupled with the

96 n nano-posts on glass, are fabricated in one lithographic step that could be performed with high-thro

97 ransistor fabrication requires only a single lithographic step.

98 chieved because they are defined in a single lithographic step.

99 fabrication techniques often require complex lithographic steps and the use of toxic chemicals.

100 trates that can be fabricated using top-down lithographic strategies.

101 ly control thermal emission, often requiring lithographic structuring of the surface and causing sign

102 miconductor junctions in MoTe2 in a two-step lithographic synthesis.

103 cost of the state-of-the-art high-resolution lithographic systems are prompting unconventional routes

104 Micro-3D printing is a lithographic technique capable of creating aggregates in

105 We developed a lithographic technique for fabrication of chemically ani

106 The lithographic technique is applicable to a wide variety o

107 Microengraving is a soft lithographic technique that provides a rapid and efficie

108 ur presentation of this strategy includes: a lithographic technique to build functional microfluidic

109 We describe the lithographic technique used to form endothelialized micr

110 In this laser-based lithographic technique, microscopic containers are forme

111 ing a unique fluorinated barrier layer-based lithographic technique, we fabricated a lateral organic

112 es on the development of a parallel ion beam lithographic technique, which assures the time-effective

113 Here we describe a different lithographic technique, which we call erasable electrost

114 A simple, scalable, non-lithographic, technique for fabricating durable superhyd

115 Standard lithographic techniques and anisotropic deep-reactive io

116 y to a surface generally requires the use of lithographic techniques and specialized equipment.

117 rds integrating MOF deposition with existing lithographic techniques and the incorporation of these m

118 This technology adapts the lithographic techniques from the microelectronics indust

119 Many soft-lithographic techniques have been developed for their fa

120 ic constraints of conventional synthetic and lithographic techniques have limited the types of multi-

121 Soft-lithographic techniques show great promise for simple an

122 addition, DLAs are fabricated via low-cost, lithographic techniques that can be used for mass produc

123 From lithographic techniques that enable high-density silicon

124 thin films of block copolymer with advanced lithographic techniques to induce epitaxial self-assembl

125 The concepts are illustrated by use of soft lithographic techniques to transfer 2D patterns to cylin

126 First, traditional lithographic techniques were adapted to fabricate bulk e

127 The fusion of maturing low-cost lithographic techniques with newer optical design strate

128 abricate cheap, large-area devices using non-lithographic techniques--for example, by exploiting dewe

129 res with a precision that challenges current lithographic techniques.

130 cating nanoscale arrays are usually based on lithographic techniques.

131 magnitude smaller than can be fabricated by lithographic techniques.

132 onventional nanostructure formation based on lithographic techniques.

133 ing capabilities that are unmatched by other lithographic techniques.

134 maller than what can be produced by top-down lithographic techniques.

135 technology due to the limitations of current lithographic techniques.

136 we focus on three of the commonly used soft lithographic techniques: (i) microcontact printing of al

137 h is based on fast, low-cost, and high-yield lithographic technologies and demonstrates the feasibili

138 There is growing interest in lithographic technologies for creating 3D microstructure

139 llars that uses polystyrene nanospheres as a lithographic template.

140 Using soft lithographic templates, we assemble three-dimensional, g

141 layer-by-layer alignment or high-resolution lithographic templating.

142 onstructing larger materials with the use of lithographic tools (i.e., physical top-down) or through

143 Lithographic top-down processing allows a high level of

144 tracking microscopy, we show that microscale lithographic triangular platelets form two different tri

145 QCL output are selectively suppressed using lithographic tuning and single mode operation of the mul

146 between the Au-filled template array and the lithographic UME platform array was achieved by potentio