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1 x wafer, and statically coated with dimethyl polysiloxane.
2 butes to retention more than the bulk liquid polysiloxane.
4 dimethylpolysiloxane, 50% phenyl-50% methyl polysiloxane, 50% cycanopropylphenyl-50% methyl polysilo
5 column ensemble consisting of 4.5-m dimethyl polysiloxane and 7.5-m trifluoropropylmethyl polysiloxan
6 of 7.0-m lengths of a trifluoropropylmethyl polysiloxane and a 5% phenyl dimethyl polysiloxane colum
9 sing a 0.50-microm film of nonpolar dimethyl polysiloxane and the second using a 0.25-microm film of
14 consisting of a polar trifluoropropylmethyl polysiloxane column and a nonpolar 5% phenyl dimethyl po
15 ries-coupled ensemble of a nonpolar dimethyl polysiloxane column and a polar trifluoropropylmethyl po
16 0-m length of polar, (trifluoropropyl)methyl polysiloxane column followed by a 7.0-m length of nonpol
17 sists of a 4.5-m length of nonpolar dimethyl polysiloxane column followed by a 7.5-m length of polar
18 ensemble consists of a trifluoropropylmethyl polysiloxane column followed by a dimethyl polysiloxane
19 methyl polysiloxane and a 5% phenyl dimethyl polysiloxane column was temperature-programmed at 50 deg
20 ane column and a polar trifluoropropylmethyl polysiloxane column with independent at-column heating i
25 ed from 4600 to 8200 plates for the dimethyl polysiloxane columns and from 3500 to 5500 plates for th
26 d the poly(ethylene glycol) and dicyanoallyl polysiloxane columns showed excessive deterioration in a
27 imethyl polysiloxane and the trifluoropropyl polysiloxane columns showed good efficiency and no signi
28 ne and the 50% cycanopropylphenyl-50% methyl polysiloxane columns showed poorer efficiency, and the p
30 a 0.5-microm-thick film of nonpolar dimethyl polysiloxane coupled in series to a polar column, either
31 and processing, which allows functionalized polysiloxane derivatives to be fabricated into 3D micros
32 ents, demonstrated unequivocally the role of polysiloxane-encapsulated "Pd"-nanoclusters as the real
37 5-microm film of polar trifluoropropylmethyl polysiloxane is operated with atmospheric pressure air a
38 silyl protection for catechol-functionalized polysiloxanes is demonstrated and represents a promising
44 polysiloxane and 7.5-m trifluoropropylmethyl polysiloxane operated at an outlet pressure of 0.5 atm p
45 used to deposit a film of nonpolar dimethyl polysiloxane or moderately polar trifluoropropylmethyl p
47 nyl-50% methyl polysiloxane, trifluoropropyl polysiloxane, poly(ethylene glycol), and dicyanoallyl po
48 as achieved by in-situ- or ex-situ-generated polysiloxane-stabilized "Pd"-nanoclusters under mild rea
49 to prepare a nonpolar column with a dimethyl polysiloxane stationary phase and a moderately polar col
51 tography utilizing a methylated cyclodextrin/polysiloxane stationary phase is presented for the first
52 th a Pyrex wafer, and coated with a dimethyl polysiloxane stationary phase is used for the GC separat
57 ysiloxane, 50% cycanopropylphenyl-50% methyl polysiloxane, trifluoropropyl polysiloxane, poly(ethylen
58 loxane and dimethyl (50% liquid crystalline) polysiloxane] were compared, and retention indexes (RI)
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