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1 bility in epitaxial graphene on silicon-face silicon carbide.
2 kanes using Fe and Ni particles supported on silicon carbide.
3 ctly view and measure stable crack growth in silicon carbide.
4 gs potential similar to or exceeding that of silicon carbide.
5 inated silicon and carbon faces of hexagonal silicon carbide.
6 y more stable than a mixture of SiO2, C, and silicon carbide.
7 nhydride have also been observed on powdered silicon carbide.
9 graphene thin films deposited on insulating silicon carbide and report the characterization of their
10 and surface reconstruction of single-crystal silicon carbide and study this process by high-resolutio
14 We used SLG surfaces supported on copper, silicon carbide, and transparent fused silica (SiO(2)) s
16 de graphene nanoribbons epitaxially grown on silicon carbide are single-channel room-temperature ball
18 rred crystallographic class of circumstellar silicon carbide based on astronomical infrared spectra i
20 tization with graphite, carbon nanotubes, or silicon carbide can be used to carry out reactions more
22 ate that the silicon in the derivative forms silicon carbide compounds in the heated cupric oxide rea
24 orine doping on hydrophobicity of nanoporous silicon carbide-derived carbon (SiCDC), and investigate
25 sure the fracture energy for a bi-crystal of silicon carbide, diffusion bonded with a thin glassy lay
27 sed FBC used in combination with an uncoated silicon carbide filter and report effects on emissions o
28 transmission electron microscopy of presolar silicon carbide from the Murchison carbonaceous meteorit
29 agonal structure, by extracting silicon from silicon carbide in chlorine-containing gases at ambient
30 y the single epitaxial graphene layer at the silicon carbide interface and reveal the Dirac nature of
31 metal-induced transformation of diamond and silicon carbide into graphene suffers from metal contami
36 Here we demonstrate high-frequency multimode silicon carbide microdisk resonators and spatial mapping
37 d for measuring the electrical properties of silicon carbide nanoclusters and gallium arsenide nanowi
38 e we show that a dense uniform dispersion of silicon carbide nanoparticles (14 per cent by volume) in
41 GBs) on the amorphization of nanocrystalline silicon carbide (nc-SiC) by point defect accumulation.
42 ically made from single-crystalline silicon, silicon carbide or gallium nitride p-n junction photodio
44 ir saturated forms; hexagonal boron nitride; silicon carbide), rare earth, semimetals, transition met
45 simulation of indentation of nanocrystalline silicon carbide reveals unusual deformation mechanisms i
53 esent work shows that HF etching of oxidized silicon carbide (SiC) leads to a very different surface
54 semiconductor field-effect transistors with silicon carbide (SiC) nanoelectromechanical system (NEMS
55 s consumed as sludge waste consisting of Si, silicon carbide (SiC) particles and metal impurities fro
56 ion of ruthenium (Ru) in individual presolar silicon carbide (SiC) stardust grains bears the signatur
57 graphene field-effect transistors (GFET) on silicon carbide (SiC) substrates by scanning a focused l
60 rowth of graphene nanoribbons on a templated silicon carbide substrate prepared using scalable photol
62 ransfer single crystalline graphene grown on silicon carbide substrates to flexible polycarbonate tra
63 operties of epitaxial graphene (EG) grown on silicon carbide substrates; we demonstrate the availabil
64 se laser irradiation triggers melting of the silicon carbide surface, resulting in a phase separation
66 The CCS method is now applied on structured silicon carbide surfaces to produce high mobility nano-p
67 gas mixture leads to a stable conversion of silicon carbide to diamond-structured carbon with an ave
68 raphene synthesized on the silicon face of a silicon carbide wafer, achieving a cutoff frequency of 1
70 tunneling spectroscopy of graphene grown on silicon carbide, we directly observed the discrete, non-
71 ed containing largely debris of silicon, and silicon carbide, which is a common cutting material on t
72 l vapor deposition (CVD) or via reduction of silicon carbide, which unfortunately relies on the abili
73 rect two-photon absorption (TPA) occuring in silicon carbide with either cubic or wurtzite structure.
74 is work, we fabricate 1D nanobeam PCCs in 4H-silicon carbide with embedded silicon vacancy centers.
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