ライフサイエンスコーパス: electron beam

1 two different irradiation sources (gamma and electron beam).

2 iation doses and technologies (cobalt-60 and electron-beam).

3 ent, exert Lorentz forces on the propagating electron beam.

4 ue to the intrinsic partial coherence of the electron beam.

5 of 100 megaelectronvolts for a subset of the electron beam.

6 g can be controlled by proper shaping of the electron beam.

7 ure the dose delivered from a 200 MeV pulsed electron beam.

8 manipulating the lasing medium, that is, the electron beam.

9 negative resist through interactions with an electron beam.

10 hene by tailoring its exposure to a focussed electron beam.

11 droplet into a toroidal shape induced by the electron beam.

12 controlling the parameters of the generated electron beam.

13 e pre-compressed fuel core via a high-energy electron beam.

14 omplex mixture of radiolysis products by the electron beam.

15 ansverse momentum structure imprinted on the electron beam.

16 magnesium oxide nanocubes using an atom-wide electron beam.

17 well as time-resolved experiments with free-electron beams.

18 changes of the kinetic state of relativistic electron beams.

19 the laser pulse and can be used for guiding electron beams.

20 science and medical therapy with X-rays and electron beams.

21 standing membranes into tubes by exposure to electron beams.

22 with independent control of both the ion and electron beams.

23 ce energy spread and longitudinal profile of electron beams.

24 ansverse focusing lens system for MeV-energy electron beams.

25 tors capable of producing ultra-relativistic electron beams.

26 , or ultracold atomic systems, and even with electron beams.

27 ve of this work was to display the effect of electron beam accelerator doses on properties of plastic

28 n with swift ( approximately 2.5 MeV energy) electron beams allows to compensate these defects, bring

29 the screw displacements are parallel to the electron beam and become invisible when viewed end-on.

30 The production mechanism micro-bunches the electron beam and ensures the pulses are radially polari

31 s evaporated due to the use of a high-energy electron beam and the process was imaged in situ inside

32 s show the excitation of guided modes by the electron beam and their efficient detection via photons

33 atoms give excellent scattering contrast for electron beam and x-ray experiments.

34 Gamma radiation, electron beam and X-rays have emerged as the favoured me

35 tight constraints on the properties of such electron beams and new diagnostics for their presence in

36 w polar domain walls can be manipulated with electron beams and show that phase domain walls tend to

37 wok was designed to evaluate the effects of electron-beam and gamma irradiation over the phenolic pr

38 Gamma, electron-beam and UV irradiation have been shown to be p

39 Results: Bremsstrahlung radiation from the electron beam, and consequently (15)O production via pho

40 lthough nanoimprinting, extreme ultraviolet, electron beams, and scanning probe litho-graphy are cand

41 the hydrated electrons e(-)aq created by the electron beam are responsible for the reduction of metal

42 ticles, such as protons and ion beams.Vortex electron beams are generated using single electrons but

43 Here, we use a scanning electron beam as a point source to probe the LDOS.

44 In situ TEM revealed an electron beam assisted transformation of In(2)O(3) nanop

45 Powerful field-aligned electron beams associated with the Io-Jupiter coupling,

46 t by releasing an additional tailored escort electron beam at a later phase of the acceleration, when

47 onization injection generates higher-quality electron beams at lower intensities and densities, and i

48 with regard to the primary ion beam and the electron beam azimuth.

49 s with nanometre precision is possible using electron-beam-based techniques.

50 ever, none has attempted to manipulate multi-electron beams, because the repulsion between electrons

51 ability to shape the wavefunction of EBeams (Electron-Beams) become experimentally accessible.

52 direction to the movement of a single sheet electron beam bunch in the experiment.

53 acuum focal spot produces a greatly inferior electron beam, but instead correspond to the particular

54 slocation lying in a plane transverse to the electron beam by optical sectioning using annular dark f

55 as essential to achieve narrow energy-spread electron beams by ionization injection.

56 cheme for the realization of non-diffracting electron beams by shaping wavepackets of multiple electr

57 With this device, a low-energy electron beam can be injected orthogonally into the anal

58 Although the emittance of accelerated electron beams can be low, it can grow due to the effect

59 control, through photoionization, attosecond electron beams carrying OAM.

60 se oscillation, and the other relying on the electron beam catching up with the rear part of the lase

61 We are able to improve both the electron beam charge and angular distribution by an orde

62 laser pulse shape caused an 80% increase in electron beam charge, despite the pulse length changing

63 edge of the distribution of laser energy and electron beam charge, which determine the overall effici

64 atio (R) of Fe to Lanthanide (Dy + Tb) using electron beam co-evaporation at room temperature.

65 res in 2000 to 2001, and CAC was measured by electron beam computed tomography in 2000 to 2001 and 20

66 presence of subclinical atherosclerosis, by electron beam computed tomography scanning.

67 coronary artery calcification determined by electron beam computed tomography was assessed in models

68 d at baseline and at 3 years follow up using electron beam computed tomography.

69 ness, coronary artery calcification score on electron-beam computed tomography, homocysteine, and lip

70 by coronary artery calcification (CAC) using electron-beam computed tomography.

71 e liquid cell membrane surface chemistry and electron beam conditions, the dynamics and growth of met

72 High energy electron beams consisting of a long train of dense bunch

73 gile magnetic-controlled particle, and 3) an electron-beam-controlled reversible microactuator with s

74 uared error based pre-training, this enables electron beam coverage to be decreased by 17.9x with a 3

75 on of the rate of Pd deposition at different electron beam currents and as a function of distance fro

76 ause of those same peptides and not aberrant electron beam damage effects.

77 tron microscopy techniques that minimize the electron beam damage for the extraction of intrinsic str

78 ally, the present study provides examples of electron beam damage on lithium-ion battery materials an

79 owever, battery materials are susceptible to electron beam damage, complicating the data interpretati

80 pristine chemical environments by minimizing electron beam damage, for example, using fast electron i

81 lectron-matter interaction and mechanisms of electron beam damage.

82 o the generation of narrow energy-spread GeV electron beams, demonstrating its robustness and scalabi

83 then deposited on the fibAu_NR arrays using electron beam deposition to improve the surface-enhanced

84 e UED user community, beyond the traditional electron beam diagnostics of accelerators used by accele

85 ed as a probe to determine the effect of the electron beam dose rate and preloaded etchant, FeCl(3),

86 Initially, illuminating the sample at a low electron beam dose rate generates hydrogen bubbles, prov

87 Increasing the electron beam dose rate leads to a constant etching rate

88 t etching rate that varies linearly with the electron beam dose rate.

89 post-synthesis activation, ion bombardment, electron beam drilling, and nanolithography, are worthy

90 We measured coronary calcification using electron-beam dual-source computed tomography and Agatst

91 volving reduction by e(-)aq generated by the electron beam during in situ liquid TEM/STEM.

92 anus asymmetry of the nanomotors is given by electron beam (e-beam) deposition of a very thin platinu

93 Electron beam (e-beam) efficiently and non-thermally ina

94 sion electron microscopy studies is that the electron beam (e-beam) exposure does not fundamentally a

95 Electron-beam (e-beam) deposition of carbon on a gold su

96 a silicon-on-insulator (SOI) substrate using electron-beam (e-beam) lithography and reactive-ion-etch

97 In this report we used an electron-beam (e-beam) lithography technique to fabricat

98 scale structures and their fabrication using electron-beam (E-beam) lithography.

99 Analysis (LDA) is applied to investigate the electron beam effects on the X-pinch produced K-shell Al

100 , the coherence of which depends directly on electron beam emittance.

101 particular, the outstanding transparency to electron beam endows graphene membranes great potential

102 r is experimentally verified by encoding the electron beam energy and spatial-pointing jitter informa

103 gth within 200-300 nm by modification of the electron beam energy and the undulator field.

104 s method is that it allows us to extract the electron beam energy spread concurrently with the ongoin

105 tic monochromator allows the scanning of the electron beam energy with a 10(-5) precision, enabling o

106 real-time, nondestructive, Bragg-diffracted electron beam energy, energy-spread and spatial-pointing

107 By controlling the electron-beam energy, we demonstrate the contrast imagin

108 iment and enables online optimization of the electron beam especially for future high charge single-s

109 layers with native defects are deposited by electron beam evaporation in an oxygen-deficient environ

110 The top contact was obtained by direct electron-beam evaporation on the molecular layers throug

111 esentation of LDA shows that the presence of electron beam exhibits outward spirals of Langmuir turbu

112 r(R) 29 fiber was revealed through a focused electron beam experiment inside a scanning electron micr

113 o decrease electron microscope scan time and electron beam exposure with minimal information loss.

114 t a new resist that protects proteins during electron-beam exposure and its application in direct-wri

115 Total skin electron beam followed by allogeneic stem-cell transplan

116 es using near-parallel, bright and ultrafast electron beams for single-shot imaging, to directly visu

117 radical protein footprinting using a pulsed electron beam from a 2 MeV Van de Graaff electron accele

118 Stable electron beams from a first LPA were focused to a twenty

119 high-gradient acceleration of monoenergetic electron beams from a helical IFEL.

120 rradiated with 3, 4, 7, 9, and 18 MeV energy electron beams from two different institutions, and the

121 rs on surfaces, but the damage caused by the electron beam has made it difficult to image zeolites.

122 The OAM states of electron beams have been shown to be similarly useful, f

123 e/amorphous interface is characterized by an electron beam heating technique with high measurement sp

124 Electron beam illumination greatly increases the local c

125 cedented, reaching 0.63 eV under the 200-keV electron beam illumination, and separated peaks of the P

126 llium-ion beam mills the particle, while the electron beam images the slice faces and energy-dispersi

127 Electron beam imaging and analysis show that olivine and

128 t of PINEM using a focused, nanometer-scale, electron beam in diffraction space for measurements of i

129 unction shaping facilitates the use of multi-electron beams in electron microscopy with higher curren

130 r Plasma Accelerators (LPAs), delivering GeV electron beams in few centimeters, are good candidates f

131 esent a method of creating highly collimated electron beams in graphene based on collinear pairs of s

132 r rACP but not when PMN were challenged with electron beam-inactivated C. burnetii.

133 ve post-processing methods such as localised electron beam induced chemical etching.

134 We have applied this to the study of electron beam induced defect coalescence and to long ran

135 was designed specifically for use in focused electron beam induced deposition (FEBID) of Pt nanostruc

136 fabrication of Ru nanostructures by focused electron beam induced deposition (FEBID) requires suitab

137 This is briefly illustrated by the case of electron beam induced deposition where additional strate

138 croscopes can now provide atomic resolution, electron beam induced specimen damage precludes high res

139 In addition, cryo-EM can be used to observe electron-beam induced dissipation of nanobubble encapsul

140 graphy, transmission electron microscopy and electron beam-induced current are used to clarify the de

141 To this end, we demonstrate electron beam-induced current measurements as a powerful

142 By clarifying the contrast mechanisms in electron beam-induced current microscopy, it is possible

143 By comparing beam energy-dependent electron beam-induced currents with Monte Carlo simulati

144 rest in characterizing biological phenomena, electron beam-induced damage remains a significant probl

145 e report the experimental description of the electron beam-induced dynamics of nanoscale water drople

146 lectron-counting detector, we confirmed that electron beam-induced motion substantially degrades reso

147 design that eliminates buckling and reduces electron beam-induced particle movement to less than 1 a

148 improves on signal quality, while minimizing electron beam-induced structure modifications even for s

149 ields using off-axis electron holography and electron-beam-induced current with in situ electrical bi

150 namic high-angle annular dark-field imaging, electron-beam-induced damage was followed, revealing the

151 We prepare the metallic bead strings by electron-beam-induced interparticle fusion of nanopartic

152 Furthermore, though electron-beam-induced irreversible atomic displacements

153 We also report electron-beam-induced rapid displacement of monolayers,

154 ct-ratios of ~100 can be grown using focused electron-beam-induced-deposition.

155 we report that graphene edges fabricated by electron beam-initiated mechanical rupture or tearing in

156 the transport and energy deposition of this electron beam inside the pre-compressed core is the key

157 ions are steady in liquid cell regardless of electron beam intensity.

158 ion trapping period at the region of ion and electron beam intersection.

159 Is (specifically (40)Ar(13+)) produced in an electron beam ion trap and retrapped in a cryogenic line

160 We present electron beam ion trap measurements of its spectra, incl

161 study aims to evaluate the effectiveness of electron beam irradiation (EBI) exposure on CSP for micr

162 ar. candida alba Buch.-Ham were submitted to electron beam irradiation at the doses of 0.5, 0.8 and 1

163 The effects of different electron beam irradiation doses in Amanita genus, were a

164 Among the emerging irradiation technologies, electron beam irradiation has wide applications, allowin

165 n(0.4)Co(0.18)Ti(0.02)O2 particles, repeated electron beam irradiation induced a phase transition fro

166 h nanometer-scale spatial density by focused electron beam irradiation induced local 2H to 1T phase c

167 ective formation of radicals was achieved by electron beam irradiation of aqueous solutions of H2O2 o

168 of vacuum packaging followed by high-energy electron beam irradiation on the shelf-life of fillets o

169 e behavior within the liquid cell, and under electron beam irradiation, is of paramount importance fo

170 In this study, we demonstrate that, under electron beam irradiation, the surface and bulk of batte

171 , and rapid optical signal degradation under electron beam irradiation.

172 due to the extreme instability of MOFs upon electron beam irradiation.

173 bilization to proteins during the vacuum and electron-beam irradiation steps.

174 e interaction between water and oxides under electron-beam irradiation.

175 ene is ferromagnetic and may be patterned by electron-beam irradiation.

176 nto semiconducting beta-phase under heat and electron-beam irradiation.

177 An electron beam is a physical tool that is capable of prep

178 accounting for the partial coherence of the electron beam is a prerequisite for high-quality structu

179 We also demonstrate that the micro-bunched electron beam is itself an effective wakefield driver th

180 ugh numerical simulations that a high-energy electron beam is produced simultaneously with two stable

181 Additive manufacturing by an electron beam is promising to this end, but there is a f

182 f ultra-intense lasers and laser-accelerated electron beams is enabling the development of a new gene

183 ts of the catalytic properties of Pt and the electron beam itself.

184 n potentials of the species in solution, the electron beam likely controls the total concentration of

185 osed by the physics of 'standard' photon and electron beams limit further dose escalation.

186 Our method combines electron beam lithography and a low temperature hydrothe

187 We use electron beam lithography and wafer scale processes to c

188 the Au/ZnO-nanowire/Au nanomemory device by electron beam lithography and, subsequently, utilized in

189 2 nanowire arrays across 6-inch wafer, using electron beam lithography at 100 kV and polymethyl metha

190 A new resist material for electron beam lithography has been created that is based

191 Electron beam lithography is a powerful technique for th

192 Electron beam lithography is used to pattern MoSe2 monol

193 all spacer technique instead of an expensive electron beam lithography method.

194 Using electron beam lithography the targeted structure has bee

195 We demonstrate that by using electron beam lithography to manipulate the nanoscale ge

196 nlike the common approaches, which depend on electron beam lithography to sequentially fabricate each

197 , such as incompatibility with spin coating, electron beam lithography, optical lithography, or wet c

198 Besides electron beam lithography, stencil lithography, nano-imp

199 ch can be readily fabricated by conventional Electron Beam Lithography, sustain highly complex struct

200 a lift-off free fabrication method based on electron beam lithography, where the plasmonic nanohole

201 ome high-end applications require the use of electron-beam lithography (EBL) to generate such nanostr

202 (SOI) layers achieved by combination of the electron-beam lithography (EBL), plasma dry etching and

203 ple of the viability of all-water-based silk electron-beam lithography (EBL), we fabricate nanoscale

204 g in GaAs semiconductors using variable dose electron-beam lithography (EBL).

205 Here we describe the use of electron-beam lithography and dry oxidative etching to c

206 lloy (EGaIn) using a hybrid method utilizing electron-beam lithography and soft lithography.

207 lymer films, focused ion-beam sculpting, and electron-beam lithography and tuning of silicon nitride

208 ted that focused ion beam and layer-by-layer electron-beam lithography can be used to pattern the nec

209 Direct-write techniques such as electron-beam lithography can create complex nanostructu

210 f-the-art nanofabrication techniques such as electron-beam lithography have a resolution of a few nm

211 ensions of the DBTs enabled high-sensitivity electron-beam lithography of patterns with widths of onl

212 ransitions combined with nanometre-precision electron-beam lithography offers us the capability to fi

213 Previous routes use electron-beam lithography or direct laser writing but wi

214 Electron-beam lithography was used to fabricate micromet

215 of reach of lithographic approaches (such as electron-beam lithography) that are otherwise required t

216 iation (photo- and interference lithography, electron-beam lithography), mechanical contact (scanning

217 res with top-down patterning methods such as electron-beam lithography, an initial nanometer-scale la

218 g the high-precision alignment capability of electron-beam lithography, surfaces with complex pattern

219 tion of PhC cavities has typically relied on electron-beam lithography, which precludes integration w

220 ch as ink-jet printing, screen printing, and electron-beam lithography, whose limitations have hamper

221 isting fabrication methods typically involve electron-beam lithography--a technique that enables high

222 lk as a natural and biofunctional resist for electron-beam lithography.

223 t is currently achievable using conventional electron-beam lithography.

224 he molecular layers through masks defined by electron-beam lithography.

225 be limited by laser diffraction, dephasing, electron-beam loading and laser-energy depletion.

226 post-manufacture HIPing the fatigue life of electron beam melting (EBM) additively manufactured part

227 The Electron Beam Melting (EBM) process alleviates this to s

228 s are amenable to crack-free 3D printing via electron beam melting (EBM) with preheat as well as sele

229 the liquid state by novel combination of the electron beam melting additive manufacture and hot isost

230 ad industrial applicability, including where electron-beam melting or directed-energy-deposition tech

231 The post-electron-beam-melting, pre-solutionizing recovery via su

232 Electron beam nanolithography was used to fabricate 20 x

233 roscope (SEM), optical tweezers, and focused electron-beam nanomanipulation.

234 The electron beam not only stimulated the solution to reduce

235 etermined by optimizing the intensity of the electron beam not to melt or deform the quartz nanotip w

236 The pores are created using the electron beam of a conventional transmission electron mi

237 The continuous electron beam of conventional scanning electron microsco

238 ield regime would translate to monoenergetic electron beams of ~100 keV.

239 detection of magnetic-field-aligned ion and electron beams (offset several moon radii downstream fro

240 polymers or via irradiation with high-energy electron-beam or gamma-ray radiations.

241 nary artery calcification was assessed using electron-beam or multidetector computed tomography.

242 dynamics on single nanostructures by X-rays, electron beams, or tunnelling microscopies, is invasive

243 The one-to-one mapping between the electron beam parameter and the diffraction peak broaden

244 andwidth can be made with moderate laser and electron beam parameters.

245 grated chemiresistor (CR) vapor sensors with electron-beam patterned interface layers of thiolate-mon

246 refully spaced and shaped posts, prepared by electron-beam patterning of an inorganic resist, can be

247 uire a specific transport line, to shape the electron beam phase space for achieving ultrashort undul

248 Hollow cylindrical specimens, with electron beam physical vapour deposited coatings, were t

249 ajor difficulty is overcome using an 'aloof' electron beam, positioned tens of nanometres away from t

250 With an electron beam probe, we visualized the distribution of s

251 The bunched structure of the very long electron beam produced spectral lines that were observed

252 ngly charged lipid ions are irradiated by an electron beam, producing diagnostic product ions.

253 capability of analyzing and controlling the electron beam properties with few-femtosecond time resol

254 raphic slice parameters instead of projected electron beam properties.

255 n technology, which uses X-rays, gamma rays, electron beams, protons, or high-intensity focused ultra

256 method, combined with the precession of the electron beam, provides high quality data enabling the d

257 obulin A demonstrate that one submicrosecond electron beam pulse produces extensive protein surface m

258 on wakefields, where an intense relativistic electron beam radiates the demanded fields directly into

259 is conducting experiments in such a way that electron beam radiation can be used to obtain answers fo

260 Therefore, the effects of gamma and electron beam radiation on chemical and nutritional comp

261 realistic liquid conditions achievable under electron-beam radiation.

262 plemented using a deformable mirror with the electron beam signal as feedback, which allows a heurist

263 Optical and electron beam simulations are used to rationalize the ob

264 n rates are much higher, indicating that the electron beam strongly affects the galvanic-type process

265 t of femtosecond sources of X-ray pulses and electron beams suggests that they might soon be capable

266 ar movie, which are impossible using present electron-beam technologies.

267 In electron cryo-microscopy (cryo-EM), the electron beam that is used for imaging also causes the s

268 By selecting the appropriate energy of the electron beam, the metal-nanotube interactions can be co

269 When exposed to a slow electron beam, the NPs exhibit a charge/discharge behavi

270 Electron beam therapy (EBT) is commonly used for treatin

271 otene, and radiotherapy including total skin electron beam therapy.

272 omogeneous superficial dosing of traditional electron beam therapy.

273 photon energy is achieved by passing a 3 GeV electron beam through a two-stage plasma insertion devic

274 ffraction data obtained by using a very weak electron beam to collect large numbers of diffraction pa

275 results reveal how energy transfer from the electron beam to few-layer graphene sheets leads to uniq

276 , we use a picosecond pulse of a high energy electron beam to generate electrons in liquid diethylene

277 report a new strategy that uses the focused electron beam to probe the effect of differences in hydr

278 ere then cross-linked onto Si surfaces using electron beams to form micron-sized patterns of the func

279 very high energy, up to the multi-GeV-scale, electron beams, to obtain the required photon energy.

280 hat accurately predicts the deflection of an electron beam trajectory in the vicinity of the fringing

281 Besides, addition of electron beams transforms evanescent oscillations to the

282 e we report on the direct observation of the electron beam transport and deposition in a compressed c

283 powerful electron accelerators and high-rate electron beam treatment (ELT) of water and wastewater.

284 After the electron-beam treatment some additives decomposed and th

285 The safety of microwave and electron-beam treatments has been demonstrated, in regar

286 However, electron beams typically create high-energy excitations

287 er that can potentially accelerate a witness electron beam up to 6 GeV.

288 with half used to accelerate a high quality electron beam up to 84 MeV through the IFEL interaction,

289 investigate sample heating from the incident electron beam using a transmission electron microscope.

290 Activated by an 80 keV electron beam, W reacts only weakly with the SWNT, Re cr

291 In this work, by steering a focused electron beam, we directly fabricate MX nanowires that a

292 -rays are usually produced via self-injected electron beams, which are not controllable and are not o

293 ontinuously under momentum transfer from the electron beam, while maintaining their structural integr

294 ured by local thermal excitations, a focused electron beam with a graphic pattern generator to "print

295 tudied the safety and efficacy of total skin electron beam with allogeneic hematopoietic stem-cell tr

296 Changing the arrival time of the electron beam with respect to the second-stage laser pul

297 However, usually it generates electron beams with continuous energy spectra.

298 Electron beams with helical wavefronts carrying orbital

299 m the precursor compound SrBi2Ta2O9 under an electron beam within a high-resolution transmission elec

300 O that involves reducing the precursor by an electron beam without reducing agent.