ライフサイエンスコーパス: lithography

1 for positive structures (templates for soft lithography).

2 ntaining composite fabrication by two-photon lithography.

3 ns is used, which is referred to as skyrmion lithography.

4 widely used in communication, metrology and lithography.

5 tter design algorithms and industry-standard lithography.

6 izable micro-wavy pattern using direct image lithography.

7 interacting building blocks by means of nano-lithography.

8 utilizing electron-beam lithography and soft lithography.

9 e sizes below the resolution of conventional lithography.

10 orming a critical process in single-digit-nm lithography.

11 lasers fabricated by a single-mask standard lithography.

12 Pd/Ti contacts had been patterned via e-beam lithography.

13 ecording, near-field thermophotovoltaics and lithography.

14 0 nm were fabricated using deep UV immersion lithography.

15 a shallow microfluidic channel via stop flow lithography.

16 om PDMS on machined molds and do not require lithography.

17 l and biofunctional resist for electron-beam lithography.

18 guish particles synthesized by means of flow lithography.

19 achievable using conventional electron-beam lithography.

20 d channels formed by backside diffused light lithography.

21 ctrodes on elastomers made by grain boundary lithography.

22 er of cylindrical solid grains built by soft lithography.

23 of the sacrificial structures for nanoscale lithography.

24 pid prototyping method based on liquid-phase lithography.

25 ursors, which are fabricated by conventional lithography.

26 rich micropatterned films created by imprint lithography.

27 nctions produced by using low-cost colloidal lithography.

28 secure quantum communication, computing and lithography.

29 e and dimensionality of TMD crystals without lithography.

30 ented reality) that use scalable nanoimprint lithography.

31 oped glass on silicon without using advanced lithography.

32 ng for inexpensive manufacturing via imprint lithography.

33 eir fabrication using electron-beam (E-beam) lithography.

34 enable their mass-manufacture by nanoimprint lithography.

35 ned surfaces fabricated with interferometric lithography.

36 anowire devices were fabricated using e-beam lithography.

37 local probe method enabled by selected-area lithography.

38 esolution optical testing and sub-wavelength lithography.

39 unprecedented patterning performance in EUV lithography.

40 rger than the smallest features patterned by lithography.

41 sorting, on-chip passivation, and nanoscale lithography.

42 sions, beyond the resolution of conventional lithography.

43 which are then polymerized using two-photon lithography.

44 ized to create master stamps for nanoimprint lithography.

45 p" growth techniques or by "top-down" e-beam lithography.

46 Polymer pen lithography, a parallel lithographic technique, is combi

47 ing template stripping with focused ion beam lithography, a variety of aperture-based near-field prob

48 tion methods typically involve electron-beam lithography--a technique that enables high fidelity patt

49 The advent of soft lithography allowed for an unprecedented expansion in th

50 ed on a substrate can be patterned by e-beam lithography, altering the structure of their capping lig

51 gically combine three-dimensional (3D) laser lithography, an emerging micro-additive manufacturing me

52 Nanosphere lithography, an inexpensive and high throughput techniqu

53 own patterning methods such as electron-beam lithography, an initial nanometer-scale layer of a secon

54 electron microscopy, parallel beam electron lithography and advanced Xray sources.

55 directed assembly, a combination of top-down lithography and bottom-up assembly, and by the sequentia

56 n architectures, thereby converging top-down lithography and bottom-up on-surface chemistry into tech

57 asy to fabricate using single-step grayscale lithography and can be inexpensively replicated.

58 ized by using scanning probe block copolymer lithography and characterized using correlated electron

59 A combined nanoimprinting lithography and chemical surface treatment approach was

60 icrofluidic device was fabricated using soft lithography and contact printing of a conductive polymer

61 tical applications including truly nanoscale lithography and deep sub-wavelength scale confinement.

62 ficantly impact applications in neutral atom lithography and diagnostics.

63 coming a barrier in traditional resist-based lithography and dry etch where polymeric byproduct layer

64 It required only lithography and dry etching for the pore definition and

65 combination of sequential laser interference lithography and electrochemical deposition methods.

66 d wavefront sensors represents the basis for lithography and high resolution microscopy.

67 Using a combination of two-photon lithography and high-temperature pyrolysis, we have crea

68 By using standard lithography and inductively coupled plasma etching, the

69 Nanoscale lithography and information storage in biocompatible mat

70 Our device does not require high-resolution lithography and is tolerant to fabrication variations an

71 we review the fundamentals of scanning probe lithography and its use in materials science and nanotec

72 s over silicon using a combination of e-beam lithography and lift-off.

73 embrane hard masks, patterned using standard lithography and mature silicon processing technology.

74 ) random laser devices were fabricated using lithography and metallization processes.

75 ms with different topographic pitch via soft lithography and observed human corneal limbal epithelial

76 However, the conventional lithography and polymer-supported transfer methods often

77 design flexibility enabled by 3D holographic lithography and provides guidance for optimization for a

78 e-nanolattices are fabricated via two-photon lithography and pyrolysis and shown to reach the Hashin-

79 aveguide fabricated via conventional optical lithography and reactive ion etching (RIE).

80 (SOI) substrate using electron-beam (e-beam) lithography and reactive-ion-etching, the PhC sensing pl

81 specific systems, and rely on sophisticated lithography and seeding techniques, making large area or

82 n, monolayers are often patterned using soft lithography and selectively decorated with molecules.

83 sing a hybrid method utilizing electron-beam lithography and soft lithography.

84 The presented FR isolators are made via lithography and sputter deposition, which allows facile

85 ntaining aqueous photoresin using two-photon lithography and subsequently calcining them at 500 oC.

86 ndard mum-level photolithography/holographic lithography and the reconstruction-equivalent-chirp (REC

87 ectively nanoscale-doped channels using nano-lithography and thermal-diffusion doping processes.

88 We use electron beam lithography and wafer scale processes to create silicon

89 fabricated on a polyimide substrate using UV lithography and wet etching to produce flexible transpar

90 ith a net structure are fabricated via using lithography and wet etching.

91 nowire/Au nanomemory device by electron beam lithography and, subsequently, utilized in situ transmis

92 , prepared by scanning probe block copolymer lithography, and chemical vapor deposition.

93 sMA brushes were obtained using interference lithography, and confocal microscopy again confirmed the

94 ricated by multilayer deposition, nanosphere lithography, and multistep reactive ion etching were inc

95 d as optical microarrays, templates for soft lithography, and ordering matrices for the organization

96 brication, generally requiring a single-step lithography, and the possibility of vertical integration

97 nting, roll-to-roll, self-assembly, and soft-lithography are most relevant.

98 c devices fabricated using conventional soft lithography are well suited as prototyping methods.

99 represent a major advance in scanning probe lithography as a tool to generate patterns of tailored n

100 asic skill sets in photolithography and soft lithography, as well as experience with stereotaxic surg

101 Here we report a solution-based lithography-assisted epitaxial-growth-and-transfer metho

102 ays across 6-inch wafer, using electron beam lithography at 100 kV and polymethyl methacrylate (PMMA)

103 Reaction windows are opened by e-beam lithography at sites of interest on poly(methyl methacry

104 The microcell, fabricated using ultraviolet lithography, at variance with previous versions of elect

105 anolattices were fabricated using two-photon lithography, atomic layer deposition, and oxygen plasma

106 Here, a lithography-based 3D printing strategy is used to fabric

107 bioinks and bioresins in extrusion-based and lithography-based bioprinting.

108 e printability of bioinks for extrusion- and lithography-based bioprinting.

109 Nevertheless, the lithography-based device design is versatile, allowing f

110 A nanoimprint-lithography-based fabrication method to generate stable

111 200-nm silicon nitride device layer using a lithography-based process, producing predicted optical p

112 ography, nano-imprint lithography or dip pen lithography, basic photolithography is the technique whi

113 h as near-field thermophotovoltaics and nano-lithography because of the expected increases in efficie

114 copolymers is an emergent technique for nano-lithography, but is limited in the range of structures p

115 We exploited the phenomena for 3D mesoscale lithography, by showing one example where iterated depos

116 he ITO line pattern and secondary sputtering lithography can change the shape of the ITO line pattern

117 bly paradigm, scanning probe block copolymer lithography can pattern precursor materials embedded in

118 As top-down structuring methods such as lithography cannot be applied to van der Waals bound mat

119 nanoscale patterning methods, such as e-beam lithography, cannot be easily applied to such applicatio

120 The method, termed coaxial lithography (COAL), relies on templated electrochemical

121 Scalable approaches including soft lithography, colloidal self-assembly, and interference h

122 uding energy conversion, thermal management, lithography, data storage and thermal microscopy.

123 confined three-dimensional chambers that are lithography-defined, lipid-bilayer coated and isolated t

124 ransistors on a single chip using sequential lithography, deposition and lift-off processes.

125 Microfluidics-based soft-lithography devices have recently been used to automate

126 strategy of DNA-origami-based nanoimprinting lithography (DONIL) demonstrates high precision in contr

127 al nanofabrication techniques such as e-beam lithography (EBL) are often used in fabricating graphene

128 pplications require the use of electron-beam lithography (EBL) to generate such nanostructures.

129 achieved by combination of the electron-beam lithography (EBL), plasma dry etching and size reduction

130 bility of all-water-based silk electron-beam lithography (EBL), we fabricate nanoscale photonic latti

131 conductors using variable dose electron-beam lithography (EBL).

132 semiconductor processing technology, such as lithography, etch and deposition techniques.

133 currently carried out via multiple steps of lithography, etching, and transfer.

134 duction processes; or in extreme ultraviolet lithography (EUV) for the chip production, where molten

135 Extreme ultraviolet lithography (EUVL) is the leading technology for enablin

136 dicate that the combination of PS nanosphere lithography, followed by the spin-coating of AuNPs, lead

137 efractive index materials using multi-photon lithography for customization or using molding for mass

138 we report the utility of scanning helium ion lithography for fabricating functional graphene nanocond

139 ogress in simple and cost-effective top-down lithography for ~10 nm scale nanopatterns via edge and s

140 Here, we demonstrate a simple, lithography-free approach for obtaining a resonant and d

141 rge area (approximately centimeters squared) lithography-free sensing films with a naked eye limit of

142 ion of Au nanostructures, by using a simple, lithography-free, and single-step process.

143 Here, we demonstrate lithography-free, broadband, polarization-independent op

144 A lithography-free, low-cost, free-surface millifluidic de

145 nction of endothelial leader cells by plasma lithography geometric confinement generated.

146 A new resist material for electron beam lithography has been created that is based on a supramol

147 er, the limited throughput of scanning probe lithography has prevented its exploitation in technologi

148 fabrication techniques such as electron-beam lithography have a resolution of a few nm at best.

149 films, (ii) bottlebrushes for photonics and lithography, (iii) bottlebrushes for small molecule enca

150 valve cellular array is fabricated with soft lithography in a format that enables facile integration

151 components fabricated using CMOS-compatible lithography in silicon, which has the capability to vary

152 nd our current processing technology such as lithography in terms of mass-productivity and structural

153 on of poly(dimethylsiloxane) (PDMS) and soft lithography in the 90's has revolutionized the field of

154 MnxGe1-x nanomeshes fabricated by nanosphere lithography, in which a Tc above 400 K is demonstrated a

155 Here, we report wrinkle lithography integrated with concurrent design to produce

156 Solution-exchange lithography is a new modular approach to engineer surfac

157 volume manufacturing (HVM), high resolution lithography is crucial in keeping with Moore's law.

158 Extreme ultraviolet (EUV) lithography is currently entering high-volume manufactur

159 r continuous, scalable, and geometry-tunable lithography is developed, named photo-roll lithography (

160 A versatile two-photon laser lithography is employed for LC cell scaffolding to accur

161 -sized polystyrene particles via nanoimprint lithography is reported.

162 Scanning probe lithography is used to directly pattern monolayer transi

163 Electron beam lithography is used to pattern MoSe2 monolayer crystals

164 Thermal scanning lithography is used to pattern semiconducting nanoribbon

165 ed catalysts were created using a nanosphere lithography lift-off process and an applied-bias photon-

166 In this work, we use laser interference lithography (LIL) to fabricate gratings possessing multi

167 Combining this technique with lithography, local conversion could be realized at the n

168 ield of synthetic biology, microfluidics and lithography, many exciting developments have been made i

169 However, the interference lithography masks demonstrated generally suffer from lim

170 To this end, we developed a soft-lithography method of growing the archaeal cells to enab

171 This novel lithography method provides a reliable means for studyin

172 s report, we develop a versatile multiphoton lithography method that enables rapid fabrication of thr

173 tion using microslits fabricated by standard lithography method.

174 ted from PVP and methacrylic acid, using the lithography method.

175 mportance of the third dimension5,6, current lithography methods do not allow fabrication of photonic

176 lied approaches such as 2D conventional soft lithography methods that have rectangular channel cross-

177 Exploiting multiphoton lithography, microchannel networks spanning nearly all s

178 ination of computational modeling and plasma lithography micropatterning, we investigate the roles of

179 microfluidic devices made by multilayer soft lithography (MSL).

180 were discovered, including three-dimentional lithography, multiphoton chirality transfer, polarizatio

181 Besides electron beam lithography, stencil lithography, nano-imprint lithography or dip pen lithogr

182 tive approach, however, does not require any lithography, nano-mixture deposition, pre- and post-trea

183 ther hand, recent advances in nanoimprinting lithography (NIL) may enable the fabrication of large-ar

184 ode array (MEA) using a modified nanoimprint lithography (NIL) technique.

185 Nanoimprinting lithography (NIL) was the first scalable process to intr

186 onic devices was developed using nanoimprint lithography (NIL), combining a printable high-refractive

187 This process used nanosphere lithography (NSL) encompassing the deposition of monolay

188 he SiO2 NPA was fabricated by the nanosphere lithography (NSL) techniques.

189 f immobilized AgNPs fabricated by nanosphere lithography (NSL) were used to study AgNP sulfidation in

190 pproach for photoresist-free, direct optical lithography of functional inorganic nanomaterials.

191 DBTs enabled high-sensitivity electron-beam lithography of patterns with widths of only a few DBTs (

192 bined with nanometre-precision electron-beam lithography offers us the capability to finely control t

193 tructures is achieved using integrative soft-lithography on a backing splayed liquid-crystal elastome

194 the findings of the past 20 years on direct lithography on NC films with a focus on the latest devel

195 For the past 2-3 years, direct lithography on NC films with e-beams and X-rays has gone

196 mpatibility with spin coating, electron beam lithography, optical lithography, or wet chemical steps.

197 vantage over more complex approaches such as lithography or colloidal assembly.

198 ures produced by techniques (high resolution lithography or colloidal synthesis) that are complex and

199 thography, stencil lithography, nano-imprint lithography or dip pen lithography, basic photolithograp

200 Previous routes use electron-beam lithography or direct laser writing but widespread appli

201 sticated fabrication techniques such as flow lithography or multiple-emulsion microfluidics.

202 Spin-coated films, such as photoresists for lithography or perovskite films for solar cells, are eit

203 at does not require high-resolution advanced lithography or well-controlled wafer bonding techniques

204 coating, electron beam lithography, optical lithography, or wet chemical steps.

205 te, fabricated by using low-cost nanoimprint lithography over a large area, lead to a sharp peak in a

206 ave shown significant improvement over other lithography patterned CVD graphene micro ribbons.

207 Here, we demonstrate plasma lithography patterning on elastomeric substrates for elu

208 ransfer and heat dissipation, anticorrosion, lithography, photochromism, solar chemicals production a

209 forming molecular printing using polymer pen lithography (PPL), a cantilever-free scanning probe-base

210 e lithography is developed, named photo-roll lithography (PRL), by integrating photolithography with

211 anodot arrays are fabricated using a thermal lithography process and are functionalized with IFN-gamm

212 The hybrid lithography process is applied to a biphasic structure,

213 ed polymer lasers fabricated with a standard lithography process on a chip.

214 y manufactured without the conventional soft-lithography process using various sequences of the micro

215 combination with a single, traditional soft lithography process, it is possible to generate hierarch

216 s methodology can be described as a "direct" lithography process, since the exposure is performed dir

217 ip in poly(dimethyl siloxane) (PDMS) by soft lithography process.

218 and optimize the full parameter space of the lithography process.

219 Ag-assisted wet chemical etching and a photo-lithography process.

220 c detector fabricated using soft nanoimprint lithography process.

221 ed, along with the microfabrication and soft lithography protocols necessary to shape these hydrogels

222 The roll-to-roll ultraviolet nanoimprint lithography (R2R UV-NIL) technique provides a solution f

223 e direction of edge and secondary sputtering lithography research toward issues to be resolved to bro

224 robot are fabricated using moulding and soft lithography, respectively, and the pneumatic actuator ne

225 re realized through a combination of imprint lithography, self-assembly, and electrodeposition.

226 ive arrays of stable 2D nanochannels without lithography should prove useful to the study of confined

227 he well-defined regular VACNF NEAs by e-beam lithography show a much faster kinetics for cathepsin B

228 velopments in scanning probe block copolymer lithography (SPBCL) enable the confinement of multiple m

229 n particular, scanning probe block copolymer lithography (SPBCL), which combines elements of block co

230 Besides electron beam lithography, stencil lithography, nano-imprint lithograp

231 ) and thereby, can be fabricated in a single lithography step over relatively large areas (>30 mm x30

232 ngths are simultaneously defined in a single lithography step using a single material (silicon).

233 f 200 nm and can be fabricated with a single lithography step.

234 mportance in a wide variety of areas such as lithography, superhydrophobicity, and cell adhesion.

235 cision alignment capability of electron-beam lithography, surfaces with complex patterns of multiple

236 Nanoscribe Photonic Professional GT 3D laser lithography system, a two-photon polymerization (2PP) 3D

237 integration of thermochemical scanning probe lithography (tc-SPL) with a flow-through reactive gas ce

238 combination of a cost-effective microsphere lithography technique and subsequent dry/wet etching pro

239 A stencil lithography technique has been developed to fabricate or

240 nsors, we also introduce a deep ultra-violet lithography technique to simultaneously pattern thousand

241 was synthesized via facile microemulsion UV lithography technique.

242 iloxane (PDMS) microchannel through the soft lithography technique.

243 ost using standard microfabrication and soft lithography techniques (2-3 d), and they can be operated

244 In this work, using only regular lithography techniques on a conventional 15 nm GaAs quan

245 These percolation lithography techniques produced permanent photonic struc

246 diffraction grating sensor by using imprint-lithography techniques to give a "Molecularly Imprinted

247 Here, we used soft lithography techniques to produce 3 dimensional (3-D) ce

248 By employing the sputtering and e-beam lithography techniques, platinum nanoparticles (Pt NPs)

249 that are inaccessible using traditional soft lithography techniques.

250 rode array (MEA) chip fabricated by standard lithography technology for in vivo test.

251 Currently, lithography technology for the sub-7 nm node and beyond

252 By employing direct printing but not lithography technology to aim low cost and disposable ap

253 c device is fabricated using multilayer soft lithography technology, and consists of a control layer

254 ) were fabricated by specialized nano-sphere lithography technology.

255 - 7 mum for positive structures such as soft lithography templates, with a roughness of 0.35 mum.

256 rication method utilizing incline and rotate lithography that achieves sloped-wall microapertures in

257 Using electron beam lithography the targeted structure has been accurately f

258 bimorph actuator by magnetic-field-assisted lithography, the bending of the actuator can be controll

259 been introduced to fabricate molds for soft lithography, the only step for which a clean-room enviro

260 om SOI material using high-resolution e-beam lithography, thin film vacuum deposition and reactive-io

261 ed with high-throughput photo or nanoimprint lithography, thus enabling widespread adoption.

262 substrates using tip induced crystallization lithography (TICL).

263 ings are fabricated using laser interference lithography to achieve precise surface periodicities, wh

264 apid prototyping capabilities of multiphoton lithography to create and characterize a cell-capture de

265 lified resist materials developed for 193 nm lithography to EUV wavelengths.

266 late 1990s and early 2000s used such direct lithography to fabricate electrical wires from metallic

267 a stiff (1.77 MPa) environment, we use soft lithography to fabricate polydimethylsiloxane (PDMS) dev

268 We report on using interferometric lithography to fabricate uniform, chip-scale, semiconduc

269 Here, by using multiphoton ablation lithography to pattern surfaces with nanoscale craters o

270 ed photolithography with Hole Mask Colloidal lithography to pattern uniform nanoparticle arrays for b

271 cale spot of a THz beam, we use atomic layer lithography to pattern vertical nanogaps in a metal film

272 talysis was combined with immersion particle lithography to prepare polynitrophenylene organic films

273 microstructures can be achieved by grayscale lithography to produce a curved photoresist (PR) templat

274 ombines the features of nanoimprint and soft lithography to topographically construct metal thin film

275 rried out on surfaces must be increased, (2) lithography tools are needed that are capable of positio

276 The utility of scanning probe lithography towards understanding material-dependent edg

277 Two-photon lithography (TPL)-based submicrometer additive manufactu

278 More recently, secondary sputtering lithography using an ion-bombardment technique was repor

279 the state-of-the-art ultraviolet nanoimprint lithography (UV-NIL) to fabricate functional optical tra

280 r laser, simply fabricated by UV-nanoimprint lithography (UV-NIL), that is pumped with a pulsed InGaN

281 rication of these devices by multilayer soft lithography was easy and reliable hence contributed to t

282 Finally, scanning probe block copolymer lithography was used in combination with this synthetic

283 Using atomic layer lithography, we create mid-infrared-resonant coaxial ape

284 Applying 3D laser lithography, we produced and characterized micro-truss a

285 ch arrays are typically used for microsphere lithography where each sphere acts as a ball lens, focus

286 Our system is inspired by maskless lithography, where a digital micromirror device (DMD) is

287 th low reproducibility due to limitations in lithography, where sensing nanosized rare biotargets req

288 ee fabrication method based on electron beam lithography, where the plasmonic nanohole arrays are rea

289 sts were patterned by a single-mask standard lithography, whereas the waveguides were inscribed in th

290 l of interest, in contrast with conventional lithography which uses a polymeric resist as a mask for

291 w nano-patterning approach, named 'nanomotor lithography', which translates the autonomous movement t

292 d adhesion is regularly achieved by top-down lithography, which allows for direction-dependent detach

293 h high precision, paving the way towards MOF lithography, which has enormous potential in sensing and

294 ute for carrier-injected laser machining and lithography, which may reach nanometre or even angstrom

295 vities has typically relied on electron-beam lithography, which precludes integration with large-scal

296 printing, screen printing, and electron-beam lithography, whose limitations have hampered rapid innov

297 s are fabricated by combining 3D holographic lithography with conventional photolithography, enabling

298 table for various applications, interference lithography with diffractive masks stands out for its po

299 , which combines elements of block copolymer lithography with scanning probe techniques, allows one t

300 based on the hyperlens, unlike conventional lithography, works under ordinary light source without c