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1 bric or with a 'hidden' fabric of 'uncertain roughness'.
2  and C-C coupling reactions while minimizing roughness.
3 on energy, while taking into account surface roughness.
4  allowed to ascertain surface morphology and roughness.
5 uming statistically stationary and isotropic roughness.
6 nto solid substrates with varying degrees of roughness.
7  initially increases and then decreases with roughness.
8 erfections such as elongation, faceting, and roughness.
9 al layering in regions with high short-scale roughness.
10  undesirable formation of additional surface roughness.
11 ubbing of surfaces with different curvatures/roughness.
12 d Ag nanoparticles and one for the interface roughness.
13 reflectivity data with monotonic increase in roughness.
14 sponses to generate predictions of perceived roughness.
15 ons in centimeter-to-decimeter-scale surface roughness.
16 30 to 166 um) result in significantly higher roughness.
17  formation, stability, adhesion, and surface roughness.
18 t smooth and electrodes have their intrinsic roughness.
19  oriented Pt and Au films with sub-nanometer roughness.
20 s control of the film morphology and surface roughness.
21 nts that result from inevitable atomic scale roughness.
22 sponds to a well-known perceptual attribute, roughness.
23 nts were sensitive to the effects of surface roughness.
24 e microscopy (AFM) investigations due to its roughness.
25 dered by poor mechanical properties and high roughness.
26 tropically with up to 0.8 nm average surface roughness.
27 sized at 150 mTorr having the lowest average roughness.
28 h density of defect sites but relatively low roughness.
29 n the calcite surface, and increased surface roughness.
30 nd of decreasing energy loss with increasing roughness.
31 shing is heavily influenced by the substrate roughness.
32 high compression resistance, elasticity, and roughness.
33  was below the threshold set by our critical roughness.
34 uced to examine the effect on the underlayer roughness.
35  intermixing, and reduces the bottom surface roughness.
36 s silicon damage while introducing mesoscale roughness.
37  has a triangular shape to model the surface roughness.
38 ten attributed entirely to the metal surface roughness.
39 y that was inferred to have codeveloped with roughness.
40                                      Surface roughness 0.5 nm and 4.7 nm are achieved for Ra and peak
41  combination of hardness (534.58 gf.mm(-2)), roughness (0.07 mum) and density (4.41 g.cm(-3)).
42 tribution of grains on the film surface with roughness ~2 nm.
43 epositing Al at 100 degrees C with a surface roughness 9.2 nm, which caused an inclination angle of 2
44 hology of the with LbL films, with increased roughness according to atomic force microscopy data.
45 Hz, limited by surface TED due to microscale roughness along the disk sidewalls.
46 lds a very flat (0.43 nm of root-mean-square roughness), amorphous carbon film consisting of a mixtur
47  Knoop microhardness tester (final SMH), and roughness and 2D profiles using atomic force microscopy
48  changes such as an increase in cell surface roughness and cell height.
49   This leads to reduction in scattering from roughness and charged impurities, and enhanced carrier m
50 ead to distinct microscopic wear with higher roughness and complexity than caused by mineral abrasive
51 ersible attachment with, surfaces of varying roughness and compliance under wetted high-shear conditi
52 t the decrease in the diameter and increased roughness and correlation lengths makes the heat phonon
53 etermining the physical behaviors (hardness, roughness and density) of flakes of the ZrO2 nanoparticl
54         The effect of domain size on surface roughness and depth modulation was explored and related
55 the possible link between structural surface roughness and difficulty of crystallisation.
56 ngles were developed for isotropic random 2D roughness and do not account for the anisotropy induced
57 microscopy, which showed substantial surface roughness and evidence of matrix-dependent ablation yiel
58 lusters on Mg surfaces determine the surface roughness and formation of faulted structure, which in t
59  paper investigates the relationship between roughness and fouling in reverse osmosis (RO) through sp
60 d being touched with a fabric of incongruent roughness and hence opposite valence.
61  of various surface properties revealed that roughness and hydrophilicity are likely prominent parame
62 ing layer of the heterostructure and surface roughness and impurity (dangling bond) scattering on the
63 tudy, we examined the effects of interfacial roughness and interdigital stochasticity on the strength
64 e nature of the relationship between surface roughness and K for clean indoor surfaces.
65             Time invariant root-mean-squared roughness and local roughness morphology were both obser
66 e photocurable resins to enhance the surface roughness and mechanical strength of the microstructures
67 340 K as these thin films possess the lowest roughness and might exhibit lowest oxygen vacancies and
68 tant layers are deposited, combining surface roughness and necessary chemistry to result in four diff
69 ed to investigate how well appraisals of the roughness and pleasantness dimensions of isolated chords
70  commonly deposited along point bars, adding roughness and promoting sediment accumulation.
71 n subjected to strains, causing high surface roughness and seriously deteriorated optical transparenc
72 affolds is strongly dependent on the surface roughness and silicon content in the silica coating.
73 mainly attributed to the increase in surface roughness and the generation of defects and cavities dur
74 aximum value, which depends on the substrate roughness and the liquid properties.
75 id properties, the ratio of the peak to peak roughness and the surface feature mean width, determines
76        Such advanced functionality is due to roughness and the TiO2 layers on the ablated surface dur
77      In this paper we evaluate the effect of roughness and thickness of silver film substrates, fabri
78  on these substrates strongly depend on both roughness and thickness, with more significant contribut
79 he optical interference generated by surface roughness and to capture a large number of 3D particle t
80 urfaces often increase bubble nucleation via roughness and/or wettability modification to increase pe
81 f 10 nm critical dimension, 1.2 nm line-edge roughness, and 20 mJ cm(-2) exposure dose.
82 bserved on electrode surfaces with different roughness, and both appeared suitable to monitor MMP-9 a
83  the regime of infinitesimally small surface roughness, and consequently it does not capture the decr
84 meters by optimizing the morphology, surface roughness, and crystallinity of metal nanoparticles (NPs
85 effect, lattice-mismatch-induced strain, and roughness, and growth conditions, in particular, growth
86  and is affected by system pressure, surface roughness, and liquid wettability.
87 nts in scar pigmentation, thickness, surface roughness, and mechanical suppleness.
88 s of the paper, including thickness, surface roughness, and processing conditions, analogous to those
89 es in sEV nanoscale morphology, surface nano-roughness, and relative abundance of non-vesicles among
90                      We observe that surface roughness approaches an asymptotic invariant value that
91                   Nanowires with finite edge roughness are also investigated, and these demonstrate h
92       The albedo, texture, particle size and roughness are beyond the spacecraft design specification
93 For example, surface temperature and terrain roughness are higher in urban areas, increasing air turb
94 propriate surface chemistry, porosity and/or roughness are required.
95 hrough a synergistic effect from the surface roughness arising from the microparticles and the chemic
96         We are able to pinpoint faceting and roughness as the likely causes for the observed discrepa
97                        Topographical surface roughness, as small as a single monolayer variation, is
98 ce area and local flow conditions created by roughness asperities.
99 y because of the low shear stress zones near roughness asperities.
100 imulations to simulate the evolution of film roughness at pressures between 1 and 50 MPa.
101 he limiting response and are consistent with roughness at the boundary on the order of a few micromet
102 ure the decrease in energy loss with surface roughness at the large roughness regime.
103 ide (a-SiO x ) films with varying degrees of roughness at the oxide-electrode interface.
104 ting among textures with different levels of roughness (average accuracy > 84%) but lower contributio
105  that applies in the regime of large surface roughness based on the Maugis-Dugdale theory of adhesive
106  spatial variation and firing rate models of roughness based on these simulated responses to generate
107         The resulting GaP films have surface roughnesses below 1 nm RMS and exhibit room temperature
108 significant improvements in skin texture and roughness/bumpiness in KP patients with Fitzpatrick skin
109                                   The median roughness/bumpiness score was 1.0 (IQR, 1-2) for the tre
110  median overall score combining erythema and roughness/bumpiness was 3.0 (IQR, 2-4) for the treatment
111 isease severity score, including redness and roughness/bumpiness, with each graded on a scale of 0 (l
112 e antistatic gun treatment increased surface roughness but not oxygen content.
113 copy, wettability by meniscus technique, and roughness by an optical profiler.
114 mical state and without altering the surface roughness by swift heavy ion (SHI) irradiation.
115 rk can be observed and quantified by surface roughness calculations and automated morphometrics.
116                       However, the landscape roughness can be different, depending on the selection p
117 mmunity shifts affect land surface cover and roughness-changes that can dramatically alter albedo.
118 protocols while assessing changes in surface roughness, chemical composition, and wettability.
119  responses to the dot patterns used in these roughness coding experiments using a model of skin mecha
120          For decades, the dominant theory of roughness coding in the somatosensory nerves posited tha
121 sic size effect, acoustic softening, surface roughness, complex NW morphology, and dimensional crosso
122       Our study highlights the importance of roughness, composition, and chemical state effects in CO
123                      Media/collector surface roughness consistently influenced colloid deposition in
124 face properties by varying the chemistry and roughness could be of interest for self-cleaning applica
125                                      Surface roughness decreased, or even eliminated, the gap between
126             Recent experiments revealed that roughness decreases the gap in colloid attachment betwee
127 e mechanism of the POT thickness/POT surface roughness dependency on the electrochemical reactivity o
128 rphological information, such as the surface roughness derived from polymer residues, the thickness o
129                                   We examine roughness discrimination performance in a standard psych
130 .007 m/s) positively correlated with biofilm roughness due to enlarged biofilm surface area and local
131 ecently demonstrated controllable microscale roughness, ease of operation, fast response, and possibi
132 emperature profiles suggest a strong surface roughness effect(7,8).
133                              For small-scale roughness elements uniformly covering the wetted paramet
134            Using fMRI, we show that acoustic roughness engages subcortical structures critical to rap
135     It is widely believed that media surface roughness enhances particle deposition-numerous, but inc
136 stood by the significant increase in surface roughness evident by force microscopy.
137 atest variability in both shear strength and roughness exists for joint samples with smaller size, wh
138 lues of the anisotropy exponent zeta and the roughness exponents chix,y that characterize these corre
139 epitaxial SrRuO3 thin films with low surface roughness fabricated by pulsed laser deposition are stud
140 096 platinum-black electrodes with nanoscale roughness fabricated on top of a silicon chip that monol
141 rly sensitive to shape imperfections such as roughness, faceting, or edge rounding.
142 r, the electroactive surface area (EASA) and roughness factor ( R(f)) of single Pt NPs can be readily
143 nt (Cf,exp) for a given value of the surface roughness factor (R).
144 as further enhanced to 70% by increasing the roughness factor of the CuAg electrode.
145 al defects in the membrane and increased the roughness factor of the membrane surface.
146 nfer that electrode surface interactions and roughness factors are critical considerations.
147  liquid water (as opposed to ice) in between roughness features and can reduce the strength of ice ad
148  produced using two different methods: Large roughness features were created by electrodeposition on
149 by electrodeposition on copper meshes; Small roughness features were created by embedding carbon nano
150 th water in contact with the tops of surface roughness features.
151 ects on cyanobacteria cover and soil surface roughness following treatment-induced moss and lichen mo
152 hrough mechanical pressing to reduce surface roughness for improved spatial resolution; (ii) correcti
153 e natural tendon-to-bone attachment presents roughness for which the gain in toughness outweighs the
154 application of the domain period and surface roughness found by force microscopy to the interpretatio
155                                      Surface roughness has been reported to both increase as well as
156   A simple, low-cost method of creating such roughness has emerged with the development of shrink-ind
157 epend also on upper wavevector cutoff of the roughness; hence, (ii) Persson's theory does not predict
158                           More specifically, roughness (i.e., the standard deviation of cortical thic
159 demonstrating the importance of inclusion of roughness impacts in particle deposition description/sim
160 des a framework for describing media surface roughness impacts on colloid deposition.
161 mn tests were conducted to investigate media roughness impacts on particle deposition in absence of a
162 ize alone is inadequate for predicting media roughness impacts on particle deposition; rather, the re
163     These observations elucidate the role of roughness in colloid attachment under both favorable and
164                                  But surface roughness in particular makes it challenging to produce
165              Increase in the molecular layer roughness in response to the sialylation was visualized
166  contamination, charging effects and surface roughness in single-particle measurements.
167 n artificial alarms and that the presence of roughness in sounds boosts their detection in various ta
168 s, grain boundaries, and interfacial/surface roughness in the composite transducer severely limits th
169 aturant, providing experimental evidence for roughness in the energy landscape, or internal friction,
170                       The depth of the local roughness in the environment regulates the transition be
171                    Generally, enamel surface roughness increased with higher forage phytolith/silica
172 onately relative to smaller heterodomains as roughness increased, whereas attachment was insensitive
173                                      Surface roughness increases with substrate temperature and it pl
174 l, kidney cortical volume decreases, surface roughness increases, and the number and size of simple r
175 outcome being quantified by a simple surface roughness index (reef rugosity).
176 ges in nanosheet thickness, aspect ratio and roughness indicating that nanosheet coarsening and the a
177 les of PSA, we quantified the effect of path roughness induced by thermal fluctuations using a toy mo
178 ive-phase (substrate, mixed native oxide and roughness interface layer, metal oxide thin film layer,
179              Our results reveal that surface roughness is a key control on steepland sediment transpo
180                                    Energetic roughness is an important aspect that controls protein-f
181                                          The roughness is associated with conflicting interactions in
182        In contrast to the received view that roughness is irrelevant for communication [6], our data
183                                 We show that roughness is present in natural alarm signals as well as
184 ic surface with hierarchical micro/nanoscale roughness is quantitatively characterized.
185 ions during sliding were strongly related to roughness judgment accuracy.
186  had relatively little impact on accuracy of roughness judgments except when pressing on surfaces in
187            These include resolution, surface roughness, leakage, transparency, material deformation,
188 n of amorphous titanium dioxide with surface roughness less than 1 nm and negligible optical loss.
189 odynamic and adhesive torques at microscopic roughness locations.
190  compared to the PA due to its lower surface roughness, lower hydrophobicity, and significant antimic
191  that layer must be composed of grains whose roughness lowers cohesion consistently with contact mech
192 hat the quantified and standardized critical roughness managements will contribute to improvement of
193                    Results demonstrated that roughness may serve to increase the toughness of the ten
194  the average of non-native states versus the roughness measured by the variance of the free energy la
195 ith scanning electron microscopy and surface roughness measurement.
196 g a functional relationship between slip and roughness metrics.
197 gy chemistry and micro- or nanoscale surface roughness, minimizing contact between the liquid and the
198 ariant root-mean-squared roughness and local roughness morphology were both observed when employing a
199 in accordance with Raman spectra and surface roughness obtained by atomic force microscopy images.
200 s such as soft lithography templates, with a roughness of 0.35 mum.
201 were produced with an average etched surface roughness of 0.47 nm at a diamond etch rate of 45 nm/min
202 inimum size of 205 +/- 13 mum, and a surface roughness of 0.99 mum.
203 force microscopy images by computing surface roughness of 52.35 nm +/-31.76 nm which was 2 to 8 times
204               However, in a later study, the roughness of a different set of dot patterns was found t
205 onounced hydrophobicity imparted by the high roughness of a hydrophobic polymer, PGC-C18.
206 pplication of semiconductor fabrication, the roughness of a mass produced hafnium film was investigat
207                                 The size and roughness of a nanopipet can be reliably determined by o
208 s by ten-fold with increasing mesostructural roughness of Ag-IOs.
209 roximately 30 nm, but also a substantial tip roughness of approximately 5 nm.
210                        Indeed, the perceived roughness of coarsely textured surfaces tracks the spati
211  and WS2/h-BN benefit from 6.27-fold reduced roughness of h-BN in comparison to SiO2.
212 esses that changed the surface chemistry and roughness of MPs impacted MP affinity for coagulants and
213             Our results demonstrate that the roughness of oxide-derived copper catalysts plays only a
214  improves mechanical performance and reduces roughness of PDA coatings.
215 cal uniformity of the inherent, atomic-scale roughness of readily-available photomask blanks enables
216                   An increase of the surface roughness of SU-8 layers is observed after the oxygen pl
217 profiling and SEM indicated that the surface roughness of the 3DP bio-carrier was greater than that o
218                                          The roughness of the Al surface is controlled by changing th
219 ation about the folding dynamics such as the roughness of the energy landscape governing the folding
220 ited more instability due to the significant roughness of the glass around the pore mouths.
221 nd low effective contact area related to the roughness of the interfaces.
222 p or steepness versus averaged variations or roughness of the landscape, quantifying the degrees of t
223                                      The RMS roughness of the mass produced hafnium oxide film was 0.
224 iginates from the increased surface area and roughness of the solid solution.
225 g from interfacial defects and the nanoscale roughness of the substrate.
226 were compared with respect to adsorption and roughness of the surface of gold electrodes.
227 photoluminescence could be attributed to the roughness of the surface, the 2D photonic band gap (PBG)
228 o a minimum depth of ~80 mum with an average roughness of ~8 mum was engraved on the substrate.
229  This helped assess the influence of surface roughness on the disruption of the film.
230   This Review explores the impact of surface roughness on the nanoscale in preventing bacterial colon
231  with more significant contribution from the roughness on thinner films.
232 ver substrates on PDMS templates show larger roughness, on the order of 10 s of nm.
233 etter understand the boundaries within which roughness operates, attachment of a range of colloid siz
234 ate and its topographical properties such as roughness or texture.
235 e no changes in surface temperature, surface roughness, or contact angle on any surfaces tested.
236 itions, which suggests that water in surface roughness, or in adjacent micro-porosity, can protect th
237   These observations are mediated by surface roughness out of silica glass material, form an essentia
238 fferent sampling sizes is measured by the 3D roughness parameter with [Formula: see text].
239  area and pull-off force for various surface roughness parameters, substrate material properties and
240 rate material properties, surface energy and roughness parameters.
241 ically dry if the liquid-solid contact is on roughness peaks, while the roughness valleys are filled
242                                              Roughness perception through fingertip contact with a te
243            The results indicate that surface roughness plays an important role in the adsorption proc
244 sults in higher surface anisotropy and lower roughness (polishing effect).
245     Results from this research indicate that roughness primarily controlled the retention of MWCNTs,
246 ller than the GQS fraction because nanoscale roughness produced shallow interactions that were suscep
247 dox marker ([Fe(CN)(6)](3-/4-)) used and the roughness (R(q)) of the electrode surface.
248 es has been quantified using average surface roughness Ra and Abbott-Firestone curves.
249                                      Surface roughness Ra, and peak-to-valley (PV) values of 0.45, an
250 licon surfaces with a maximum peak-to-valley roughness range of a few nanometers was introduced to ex
251 k the widely observed adhesion hysteresis to roughness rather than viscoelastic dissipation.
252       Results indicate that pleasantness and roughness ratings were, on average, mirror opposites; ho
253 roughening with fast kinetics and subsequent roughness reduction with slow kinetics, upon cyclic expo
254 than the characteristic scale of the surface roughness, regardless of wetting modes.
255 rgy loss with surface roughness at the large roughness regime.
256 odel based on the occurrence of adhesion and roughness related small-scale instabilities was presente
257        This growth regime, where the surface roughness remains invariant after reaching a critical va
258 g the magnetic domain period (d) and surface roughness (Rq) as extracted from the magnetic force micr
259 d in blind conditions, using average surface roughness (Sa) and the following scale-sensitive fractal
260       In this work, we identify the critical roughness scale, below which it is possible to sustain t
261                                            A roughness scaling method that artificially modified sili
262 proximately 21 A) is correlated with surface roughness [sigma].
263 faces of the FF microplates and that surface roughness significantly changes with the presence of dif
264   The results demonstrate that media surface roughness size alone is inadequate for predicting media
265 ar, nonmonotonic manner such that a critical roughness size associated with minimum particle depositi
266 profiling of low-melting point, high surface roughness SnAg solder bump features is presented.
267 last can be seen regarding form, angularity, roughness, sphericity or convexity index.
268   According to the frequency distribution of roughness statistics, a new sampling method combining th
269 ge of the repulsive force below the particle roughness suppresses the frictionless state and also the
270 crystalline Pt, with some apparent nanoscale roughness that was not translated into an increased elec
271 obtained on glass templates exhibit nm-scale roughness, the silver substrates on PDMS templates show
272 trate that splashing is ruled by the surface roughness, the splashing ratio, and the dynamic contact
273           This study indicates that, besides roughness, the thickness of the metallic layer plays a s
274 ls that these films are very smooth with low roughness, the thin films synthesized at 150 mTorr havin
275            The morphology, porosity, surface roughness, thickness, absorption and emission characteri
276          Electrochemical sensors that employ roughness to increase their microscopic surface area off
277 ctron transport, and for imparting nanoscale roughness) to fabricate adherent thin-film composite ele
278 atial variation model accounts for perceived roughness under all tested conditions whereas the firing
279 t and decreased reversibility with increased roughness under unfavorable conditions, necessitating in
280 vapor phase of water and/or trapped gases in roughness valleys - thus keeping the immersed surface dr
281 lid contact is on roughness peaks, while the roughness valleys are filled with gas.
282 his is because trapped gas (e.g. air) in the roughness valleys can dissolve into the water pool, lead
283 dditionally, water vapor can also occupy the roughness valleys of immersed surfaces.
284                                        These roughness values do not change significantly with the th
285                               Complexity and roughness values exceed those from feeding experiments w
286 uggest that unlike the Moon, Vesta's surface roughness variations cannot be explained by cratering pr
287                               Higher surface roughness was achieved after Er:YAG laser treatment.
288                       The critical overlayer roughness was be defined by the transition of RMS roughn
289  somatosensory nerves posited that perceived roughness was determined by the spatial pattern of activ
290 acing, a result interpreted as evidence that roughness was determined by the strength of SA1 response
291  that quantitatively considers media surface roughness was developed that described experimental outc
292  colloid sizes to glass with three levels of roughness was examined under both favorable (energy barr
293 r enamel hardness decrease and higher enamel roughness were caused by the carbamide peroxide (p < 0.0
294               Enamel Knoop microhardness and roughness were evaluated.
295                           Changes in surface roughness were observed after all treatments, with S/R-I
296 on on different target materials and varying roughnesses were achieved on smooth surfaces with low ma
297 ntamination protocols resulted in changes in roughness, wettability, and chemical composition, but GC
298 ors, particularly viscosity, astringency and roughness, whereas heteromannan from grapes was associat
299 ness was be defined by the transition of RMS roughness which was 0.18 nm for the 3 nm thick hafnium o
300 ce oxygen content but did not affect surface roughness while the antistatic gun treatment increased s

 
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